The Center for Nanoscale Systems' Nanofabrication Facility (CNS-NF), provides resource and staff support for fabricating and characterizing nanoscale devices and structures.
The facility currently operates the 10,000sq.ft. LISE Cleanroom with leading-edge equipment capable of electron-beam and optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology, and device characterization.
For more information on available equipment, their capabilities, and the staff member in responsible for them, see the "Available Tools" below.
As one of the sites in the NSF funded National Nanotechnology Infrastructure Network (NNIN), the facility is also open to outside academia and industry users.
A dedicated staff team is always ready to support our users. You are encouraged to contact us directly if you have questions, concerns and suggestions about our facility, or needs in technical assistance.