About the Center for Nanoscale Systems (CNS) at Harvard University- Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- What are Nanoscale Systems? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Origins of CNS - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Mission and Goals - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS Management - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. 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Nanofabrication Facility
 

The Center for Nanoscale Systems' Nanofabrication Facility (CNS-NF), provides resource and staff support for fabricating and characterizing nanoscale devices and structures.

The facility currently has two cleanrooms ranged from class-100 to -1000 with leading-edge equipment capable of electron-beam and optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology, dicing and device characterization.

PLEASE NOTE: The Nanofabrication Facility (NF) also maintains additional pages containing useful information.
(See the sidebar on the left, under "Nanofabrication Facility")

For more information on available equipment, their capability, and person-in-charge, see the "Available Tools" below.

As one of the sites in the NSF funded National Nanotechnology Infrastructure Network (NNIN), the facility is also open to outside academia and industry users.

A dedicated staff team is always ready to support our users. You are encouraged to contact us directly if you have questions, concerns and suggestions about our facility, or needs in technical assistance.

Select Tool Category:
Available Tools
 
Back-End and Characterization
CNS ID Tool Name
CE-1 Characterization Electronics
PB-1 Signatone Probe Station
SW-2 LSD-100 Scriber/Cleaver
WB-1 Wire Bonder
 
Chemical Vapor Deposition
CNS ID Tool Name
ALD-1 Savannah Atomic Layer Deposition
CVD-2 Nexx PECVD
 
Dry Process
CNS ID Tool Name
RIE-1 South Bay RIE
RIE-3 Plasma Barrel Etcher
RIE-4 Samco UV & Ozone Stripper
RIE-5 Technics Plasma Stripper/Cleaner
RIE-6 Nexx RIE
RIE-7 Unaxis Shuttleline ICP RIE
RIE-8 STS ICP RIE
 
Furnaces
CNS ID Tool Name
RTP-1 Jipelec Rapid Thermal Processor
RTP-2 Rapid Thermal Processor
 
Lithography
CNS ID Tool Name
EL-1 Raith-150 E-Beam
EL-3 JEOL JSM-7000F
EL-4 Elionix ELS-7000
MW-1 Heidelberg Mask Writer
OL-2 AB-M Mask Aligner
OL-3 Suss MJB3 Mask Aligner
OL-4 SUSS MA6 Mask Aligner
OL-5 Suss MJB4 Mask Aligner
SC-2 Headway Spin Coater Photoresist
 
Metrology
CNS ID Tool Name
ES-1 Woollam Spectroscopic Ellipsometer
ES-2 Scanning Ellipsometer
MET-1 FLX-2320-S Thin Film Stress Measurement
MS-2 Olympus Microscope
PL-2 Veeco Optical Profiler
PL-3 Veeco Profilometer
SPM-5 Veeco NanoMan AFM
 
Physical Vapor Deposition
CNS ID Tool Name
EE-1 Lesker E-Beam Evaporator
EE-2 Edwards E-Beam Evaporator
EE-3 Sharon E-Beam Evaporator
SP-2 AJA Sputtering System
TE-1 Key High Thermal Evaporator
TE-3 Sharon Thermal Evaporator TE-3
TE-4 Sharon Thermal Evaporator TE-4
TE-5 Sharon Thermal Evaporator TE-5
 
Wet Process
CNS ID Tool Name
CD-1 Critical-Point Dryer
DI-2 Barnstead Nanopore DI Water System