About the Center for Nanoscale Systems (CNS) at Harvard University- Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- What are Nanoscale Systems? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Origins of CNS - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Mission and Goals - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS Support - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Visitor’s Info - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Administrative Office - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Employment at CNS - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Links - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- News and Events - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS NanoWire - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - How do I become a CNS/NNIN user? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Acknowledgement - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Nanofabrication Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Imaging Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Material Synthesis Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Computation Facilities Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Forms - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - CNS User Fees - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - General User Information and Policy - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - CNS Special Training Sign-up Page - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Social and Ethical Issues in Nanotechnology - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - NNIN Computation Project - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Computation Facilities Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Associated Faculty - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Seed Money Projects - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Visiting Scientist Program - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS/NNIN REU Research - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Research Experience for Teachers (RET) - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Educational Activities - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Videos - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Slides and Presentations - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Publications - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - User Stats - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS in the News - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Scientific News from the World - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - \"Synergy\" Conference website - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems.
   
 
CNS User Info
» Overview
» How do I become a CNS/NNIN user?
» Acknowledgement
» Nanofabrication Facility Use
» Imaging Facility Use
» Material Synthesis Facility Use
» Computation Facilities Use
» Forms
» CNS User Fees
» General User Information and Policy
» CNS Special Training Sign-up Page
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:
select month:
Monday, November 9th, 2009
Training - FESEM training - B15I
SEM training to use the Ultra55 and Supra55VP Field Emission Scanning Electron Microscopes.
  Time Max Attendees Available CNS Users ONLY
  1 to 4:30 PM 4 2 Register!  
Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 4:30pm 4 FULL Registration Closed  
Training - Unaxis ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 2 Register!  
         
 
Tuesday, November 10th, 2009
Training - Asylum AFM - 1st course (basic AFM imaging operation) - LISE-G04
Basic AFM imaging course, including AFM fundamental, cantilever selection, imaging modes, operation procedures and physics behind, and basic imaging processing skills.
please download/read the operation manual on line, http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  10:00am to 12:00pm 4 3 Register!  
Training - INTRODUCTORY FIB CROSSBEAM (FIB/SEM) TRAINING - B15H
Introduction to the FIB operation of the Crossbeam system by Zeiss. Requires experience with Zeiss SmartSEM software. READ SOP PRIOR TO CLASS.
  Time Max Attendees Available CNS Users ONLY
  1 pm to 5 pm 3 FULL Registration Closed  
Training - LISE clean room orientation - LISE CR (G07); in the hallway
Please bring a copy of the Orientation Form to be filled out from the CNS website. Gowning protocol and tour of the cleanroom are covered. This event takes ~1hr. We meet right in the hallway at G07. Please bring a copy of the Orientation Form to be filled out from the CNS website.
  Time Max Attendees Available Open Event!
  2pm 6 3 Register!  
Training - LISE/CNS Safety Training - LISE 311
Training required for all enrolling CNS/NNIN Users (except NNIN/C Computational Only or Remote Only Users)
  Time Max Attendees Available Open Event!
  10:00am - 12:00pm 12 8 Register!  
Training - STS PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
Training - Thermal evaporator training (TE-3, 4 & 5) - LISE cleanroom (G07); PVD Bay
Use of the Sharon TE-3 for metal thin film deposition is taught. This training takes ~3hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. After the training you will have access to TE-3, 4 and 5.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11am - 2pm 3 2 Register!  
Training - WITec Confocal Raman Microscope - LISE-G04
Basic training course on the WITec confocal Raman microscope, including the basic physics of confocal Raman, the operation procedure, spectrum/imaging process and data analysis skills.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm to 3:30pm 4 4 Register!  
         
 
Wednesday, November 11th, 2009
Training - Metrology tool for Nanofabrication process (1st course) - LISE-G07, Metrology bay in the clean-room
Basic metrology tools training, including Stylus profilometer, Single wavelength Elliosometer, 4 point probe system, Probe station and Electrical measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00am to 12:00pm 4 4 Register!  
Training - Metrology tool for Nanofabrication process (Advanced course) - LISE-G07, Metrology Bay in the clean-room
Advanced metrology tool training, including JAWoollam Spec. Ellipsometer, Veeco Optical Profiler, or Veeco AFM. Since each tool training may take 1.5~2 hours , user should email JD (jdeng@cns.fas.harvard.edu) to arrange the training schedule after sighing up.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 5:00pm 2 FULL Registration Closed  
         
 
Thursday, November 12th, 2009
Training - ADVANCED FIB/SEM CROSSBEAM TRAINING - B15H, Imaging Suite
Advanced, application specific training on Crossbeam. Must have experience using the Crossbeam before signing up.
Typical apps are TEM sample prep and Omniprobe.
  Time Max Attendees Available CNS Users ONLY
  1 pm to 6 pm 3 3 Register!  
Training - Asylum AFM - 2nd course (AFM qualification, and advanced AFM modes) - LISE-G04
Advanced AFM course, including 2 sections:
1) AFM certification. User will operate the AFM and pass the qualification to get the AFM access.
2) Based on the requirement and timing, some advanced AFM techniques will be introduced, including conductive AFM, MFM, Force measurement, fluid AFM, nanolithography...

Note, users have to read through the operation manual of Asylum AFM http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  2:00pm to 4:00 pm 3 FULL Registration Closed  
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Use of the EE-4 for thin film deposition is taught. Plan on ~2hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1pm - 3pm 3 2 Register!  
Training - EDS training - B15I
Basic training to use the EDAX EDS systems on the Ultra or Supra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1 to 4 PM 4 4 Register!  
Training - LISE Cleanroom Orientation - LISE G07 (in front of LISE Cleanroom entrance)
This orientation is required in order to become qualified as a CNS LISE Cleanroom User. Please bring the Cleanroom Orientation Form as requested in the Nanofabrication Facility Use page in the User Info section of the CNS web site. Please see that page for the additional requirements for qualification as a CNS LISE Cleanroom User.
  Time Max Attendees Available Open Event!
  12:45-1:45 20 19 Register!  
Training - MicroCT Training - LISE G27
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.0 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITE: Please complete the "CNS X-Ray Safety Requirements Form" prior to the training.
  Time Max Attendees Available CNS Users ONLY
  2:00pm-5:00pm 3 3 Register!  
Training - Nexx PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
Training - Nexx RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30pm - 4:00pm 3 2 Register!  
Training - Safety Training - Materials North Facilities - LISE G04
Training required for all CNS/NNIN Users planning to use the facilities or instruments located in LISE G04, G05 and G06 (Materials North Facilities). This training will be given by John Sweeney, Scott Ide or Evangelos Gatzogiannis on a weekly rotating basis.
IMPORTANT NOTE: This is a general safety orientation for Materials North Facilities only and will not cover specific training on tools, equipment and/or processes in these facilities. Additional training will be needed before starting to use these facilities.
  Time Max Attendees Available CNS Users ONLY
  9:30am-10:30am 10 10 Register!  
Training - Sharon e-beam evaporator training (EE-3) - LISE cleanroom (G07); PVD Bay
Use of the Sharon EE-3 for metal thin film deposition is taught. This training takes ~2hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. EE-3 can deposit the following materials: Pt, Ag, Ge, Cr, Ti, Au, Co, Ni, Pd, Cu, Mo.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10am - 12pm 3 3 Register!  
Training - Zeiss EVO wet stage training - REQUIRED IS EVO CERTIFICATION TO TAKE - B20
  Time Max Attendees Available CNS Users ONLY
  11am-1pm 4 3 Register!  
         
 
Friday, November 13th, 2009
Training - Disco-Dicing Saw training - LISE-G06
  Time Max Attendees Available CNS Users ONLY
  10:00am -12:00pm 3 3 Register!  
Training - WITec NSOM/AFM advanced training - LISE-G04
Advanced training course on the WITec system, mainly focusing on the near-filed scanning optical microscope (NSOM) and AFM, including the basic physics of NSOM, the operation procedure, data analytical skills... The WITec Raman training is required before this training. It may take 2-4 courses to get the final NSOM certification.
  Time Max Attendees Available CNS Users ONLY
  1:30 - 4:30pm 3 3 Register!  
         
 
Monday, November 16th, 2009
Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 4:30pm 4 2 Register!  
Training - Unaxis ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
         
 
Tuesday, November 17th, 2009
Training - Asylum AFM - 1st course (basic AFM imaging operation) - LISE-G04
Basic AFM imaging course, including AFM fundamental, cantilever selection, imaging modes, operation procedures and physics behind, and basic imaging processing skills.
please download/read the operation manual on line, http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  10:00am to 12:00pm 4 4 Register!  
Training - LISE clean room orientation - LISE CR (G07); in the hallway
Please bring a copy of the Orientation Form to be filled out from the CNS website. Gowning protocol and tour of the cleanroom are covered. This event takes ~1hr. We meet right in the hallway at G07. Please bring a copy of the Orientation Form to be filled out from the CNS website.
  Time Max Attendees Available Open Event!
  2pm 6 6 Register!  
Training - LISE/CNS Safety Training - LISE 311
Training required for all enrolling CNS/NNIN Users (except NNIN/C Computational Only or Remote Only Users)
  Time Max Attendees Available Open Event!
  10:00am - 12:00pm 12 12 Register!  
Training - STS PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
Training - Thermal evaporator training (TE-3, 4 & 5) - LISE cleanroom (G07); PVD Bay
Use of the Sharon TE-3 for metal thin film deposition is taught. This training takes ~3hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. After the training you will have access to TE-3, 4 and 5.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11am - 2pm 3 3 Register!  
Training - WITec Confocal Raman Microscope - LISE-G04
Basic training course on the WITec confocal Raman microscope, including the basic physics of confocal Raman, the operation procedure, spectrum/imaging process and data analysis skills.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm to 3:30pm 4 4 Register!  
         
 
Wednesday, November 18th, 2009
Training - Cleanroom Wet Bench Training - Wednesday Session - OUTSIDE Cleanroom entrance (LISE - G07) (We start OUTSIDE cleanroom)
Training in wetbench procedures, safety, and protocols, with emphasis on cleanroom safety, with some clean-room orientation, equipment information, etc Duration - 2 hours
  Time Max Attendees Available CNS Users ONLY
  10:00 AM 7 7 Register!  
Training - Metrology tool for Nanofabrication process (1st course) - LISE-G07, Metrology bay in the clean-room
Basic metrology tools training, including Stylus profilometer, Single wavelength Elliosometer, 4 point probe system, Probe station and Electrical measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00am to 12:00pm 4 4 Register!  
Training - Metrology tool for Nanofabrication process (Advanced course) - LISE-G07, Metrology Bay in the clean-room
Advanced metrology tool training, including JAWoollam Spec. Ellipsometer, Veeco Optical Profiler, or Veeco AFM. Since each tool training may take 1.5~2 hours , user should email JD (jdeng@cns.fas.harvard.edu) to arrange the training schedule after sighing up.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 5:00pm 2 2 Register!  
Training - SouthBay RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available CNS Users ONLY
  3:00pm-4:00pm 3 3 Register!  
Training - STS ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
         
 
Thursday, November 19th, 2009
Training - Asylum AFM - 2nd course (AFM qualification, and advanced AFM modes) - LISE-G04
Advanced AFM course, including 2 sections:
1) AFM certification. User will operate the AFM and pass the qualification to get the AFM access.
2) Based on the requirement and timing, some advanced AFM techniques will be introduced, including conductive AFM, MFM, Force measurement, fluid AFM, nanolithography...

Note, users have to read through the operation manual of Asylum AFM http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  2:00pm to 4:00 pm 3 3 Register!  
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Use of the EE-4 for thin film deposition is taught. Plan on ~2hr for this training. We meet promptly right at the machine in the LISE CR PVD bay. EE-4 can be used for the following materials only: Pt, Au, Ag, Ti, Ge, Pd
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1pm - 3pm 3 3 Register!  
Training - LISE Cleanroom Orientation - LISE G07 (in front of LISE Cleanroom entrance)
This orientation is required in order to become qualified as a CNS LISE Cleanroom User. Please bring the Cleanroom Orientation Form as requested in the Nanofabrication Facility Use page in the User Info section of the CNS web site. Please see that page for the additional requirements for qualification as a CNS LISE Cleanroom User.
  Time Max Attendees Available Open Event!
  12:45-1:45 20 20 Register!  
Training - Nexx PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
Training - Nexx RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30pm - 4:00pm 3 3 Register!  
Training - Safety Training - Materials North Facilities - LISE G04
Training required for all CNS/NNIN Users planning to use the facilities or instruments located in LISE G04, G05 and G06 (Materials North Facilities). This training will be given by John Sweeney, Scott Ide or Evangelos Gatzogiannis on a weekly rotating basis.
IMPORTANT NOTE: This is a general safety orientation for Materials North Facilities only and will not cover specific training on tools, equipment and/or processes in these facilities. Additional training will be needed before starting to use these facilities.
  Time Max Attendees Available CNS Users ONLY
  9:30am-10:30am 10 10 Register!  
Training - Sharon e-beam evaporator training (EE-3) - LISE cleanroom (G07); PVD Bay
Use of the Sharon EE-3 for metal thin film deposition is taught. This training takes ~2hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. EE-3 can deposit the following materials: Pt, Ag, Ge, Cr, Ti, Au, Co, Ni, Pd, Cu, Mo.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10am - 12pm 3 3 Register!  
         
 
Friday, November 20th, 2009
Training - Disco-Dicing Saw training - LISE-G06
  Time Max Attendees Available CNS Users ONLY
  10:00am -12:00pm 3 3 Register!  
Training - WITec NSOM/AFM advanced training - LISE-G04
Advanced training course on the WITec system, mainly focusing on the near-filed scanning optical microscope (NSOM) and AFM, including the basic physics of NSOM, the operation procedure, data analytical skills... The WITec Raman training is required before this training. It may take 2-4 courses to get the final NSOM certification.
  Time Max Attendees Available CNS Users ONLY
  1:30 - 4:30pm 3 3 Register!  
Seminar - X-ray MicroCT Seminar and Workshop - LISE 303 (seminar and Lunch) and LISE G27 (demos)
X-ray micro computed tomography (microCT) is a non-destructive technique that enables the user to scan a specimen at micrometer resolution and then recreate a 3-dimensional digital representation of it for sectioning and rendering. Although it was developed originally as a medical imaging technique, it is now used in many diverse fields, including material science and engineering, mechanical and aerospace engineering, geosciences, archaeology, anthropology, and biological and biomedical fields. This diversity stems from X-ray microCT’s capability to efficiently and faithfully image “soft” as well as “hard” samples or a combination of them. In addition to imaging, X-ray microCT systems are also used as metrology tools.

Please join us on November 20th, Friday for a one-day workshop that showcases the capabilities of this versatile imaging modality. The afternoon demonstrations will be on our HMXST225 microCT system in LISE G27. This is an open event so everyone is welcome, but registration is required! Please register below. Here is the agenda:

10:00am Presentation 1 - X-Ray MicroCT: The rules and when to break them
This talk will briefly discuss the theory of microCT data acquisition and reconstruction and demonstrate a series of rules of best practice to get good results. The second part will discuss when breaking these rules may give better results in specific cases.

11:00am Presentation 2 - Applications of MicroCT: What can be done
This talk will go through a series of example applications from a range of fields ranging from archaeology, through biosciences to turbine blades and zoology. For each example the final results will be shown as well as details of the scanner used to obtain them and the conditions used.

12:00pm Lunch (Sponsored by Metris)

1:00pm MicroCT demos and scanning of guests’ samples in LISE G27

Speaker Bio: Dr. David Bate gained a bachelors degree in Physics from Oxford University, UK and a Ph.D. from Imperial College, London, UK in experimental quantum optics. Since then he has worked in the design, development and application of instrumentation to cutting edge problems in industry with a number of companies. This has included work on laser mass spectrometers, scanning electron microscopes as well as X-ray microCT systems. For the last 5 years he has worked in the area of X-ray microCT with Metris (previously X-Tek Systems) based in Tring, UK.

  Time Max Attendees Available Open Event!
  10:00am-5:00pm 50 47 Register!  
         
 
Monday, November 23rd, 2009
Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 4:30pm 4 4 Register!  
Training - Unaxis ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
         
 
Tuesday, November 24th, 2009
Training - Asylum AFM - 1st course (basic AFM imaging operation) - LISE-G04
Basic AFM imaging course, including AFM fundamental, cantilever selection, imaging modes, operation procedures and physics behind, and basic imaging processing skills.
please download/read the operation manual on line, http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  10:00am to 12:00pm 4 4 Register!  
Training - LISE clean room orientation - LISE CR (G07); in the hallway
Please bring a copy of the Orientation Form to be filled out from the CNS website. Gowning protocol and tour of the cleanroom are covered. This event takes ~1hr. We meet right in the hallway at G07. Please bring a copy of the Orientation Form to be filled out from the CNS website.
  Time Max Attendees Available Open Event!
  2pm 6 6 Register!  
Training - LISE/CNS Safety Training - LISE 311
Training required for all enrolling CNS/NNIN Users (except NNIN/C Computational Only or Remote Only Users)
  Time Max Attendees Available Open Event!
  10:00am - 12:00pm 12 12 Register!  
Training - STS PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
Training - Thermal evaporator training (TE-3, 4 & 5) - LISE cleanroom (G07); PVD Bay
Use of the Sharon TE-3 for metal thin film deposition is taught. This training takes ~3hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. After the training you will have access to TE-3, 4 and 5.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11am - 2pm 3 3 Register!  
Training - WITec Confocal Raman Microscope - LISE-G04
Basic training course on the WITec confocal Raman microscope, including the basic physics of confocal Raman, the operation procedure, spectrum/imaging process and data analysis skills.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm to 3:30pm 4 4 Register!  
         
 
Wednesday, November 25th, 2009
Training - Metrology tool for Nanofabrication process (1st course) - LISE-G07, Metrology bay in the clean-room
Basic metrology tools training, including Stylus profilometer, Single wavelength Elliosometer, 4 point probe system, Probe station and Electrical measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00am to 12:00pm 4 4 Register!  
Training - Metrology tool for Nanofabrication process (Advanced course) - LISE-G07, Metrology Bay in the clean-room
Advanced metrology tool training, including JAWoollam Spec. Ellipsometer, Veeco Optical Profiler, or Veeco AFM. Since each tool training may take 1.5~2 hours , user should email JD (jdeng@cns.fas.harvard.edu) to arrange the training schedule after sighing up.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 5:00pm 2 2 Register!  
Training - SouthBay RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available CNS Users ONLY
  3:00pm-4:00pm 3 3 Register!  
Training - STS ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
         
 
Thursday, November 26th, 2009
Training - Asylum AFM - 2nd course (AFM qualification, and advanced AFM modes) - LISE-G04
Advanced AFM course, including 2 sections:
1) AFM certification. User will operate the AFM and pass the qualification to get the AFM access.
2) Based on the requirement and timing, some advanced AFM techniques will be introduced, including conductive AFM, MFM, Force measurement, fluid AFM, nanolithography...

Note, users have to read through the operation manual of Asylum AFM http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  2:00pm to 4:00 pm 3 3 Register!  
Training - LISE Cleanroom Orientation - LISE G07 (in front of LISE Cleanroom entrance)
This orientation is required in order to become qualified as a CNS LISE Cleanroom User. Please bring the Cleanroom Orientation Form as requested in the Nanofabrication Facility Use page in the User Info section of the CNS web site. Please see that page for the additional requirements for qualification as a CNS LISE Cleanroom User.
  Time Max Attendees Available Open Event!
  12:45-1:45 20 20 Register!  
Training - MicroCT Training - LISE G27
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.0 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITE: Please complete the "CNS X-Ray Safety Requirements Form" prior to the training.
  Time Max Attendees Available CNS Users ONLY
  2:00pm-5:00pm 3 3 Register!  
Training - Nexx PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
Training - Nexx RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30pm - 4:00pm 3 3 Register!  
Training - Safety Training - Materials North Facilities - LISE G04
Training required for all CNS/NNIN Users planning to use the facilities or instruments located in LISE G04, G05 and G06 (Materials North Facilities). This training will be given by John Sweeney, Scott Ide or Evangelos Gatzogiannis on a weekly rotating basis.
IMPORTANT NOTE: This is a general safety orientation for Materials North Facilities only and will not cover specific training on tools, equipment and/or processes in these facilities. Additional training will be needed before starting to use these facilities.
  Time Max Attendees Available CNS Users ONLY
  9:30am-10:30am 10 10 Register!  
         
 
Friday, November 27th, 2009
Training - Disco-Dicing Saw training - LISE-G06
  Time Max Attendees Available CNS Users ONLY
  10:00am -12:00pm 3 3 Register!  
Training - WITec NSOM/AFM advanced training - LISE-G04
Advanced training course on the WITec system, mainly focusing on the near-filed scanning optical microscope (NSOM) and AFM, including the basic physics of NSOM, the operation procedure, data analytical skills... The WITec Raman training is required before this training. It may take 2-4 courses to get the final NSOM certification.
  Time Max Attendees Available CNS Users ONLY
  1:30 - 4:30pm 3 3 Register!  
         
 
Monday, November 30th, 2009
Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 4:30pm 4 4 Register!  
Training - Unaxis ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 3 Register!  
         
 
 

11/10/09
NSEC Research Exchange Seminar, ""Surface-Enhanced Raman Scattering from a Double-Resonance Plasmon Structure"

11/13/09
CNS Presents: "CSM Instruments Live Product Demonstration: Table-Top Nanoindentation Tester"

11/13/09
CNS Special Seminar, "Resonance Energy Transfer (FRET): From Experiments to Modern Theories"

11/20/09
X-ray MicroCT Seminar and Workshop
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