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CNS User Info
» Overview
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» Acknowledgement
» Nanofabrication Facility Use
» Imaging Facility Use
» NanoMaterials Facility Use
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» General User Information and Policy
» Training Sign-up
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Thursday, July 31st, 2014
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 1 Register!  
 
Training - Finetech Flip Chip Bonder - G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder. Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection. During the bonding process, both chip and substrate are typically heated to an alloying temperature of the interconnect material.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:30 pm
4 4 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker Lumos in Transmission, ATR, and Reflection modes.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 1 Register!  
 
Training - LSD-100 Scriber/Cleaver for III-V materials - G12
Trainer: Guixiong Zhong
Basic training to use the scriber/cleaver.
  Time Max Attendees Available CNS Users ONLY
  4:30 pm - 5:00 pm
4 3 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Please meet in front of G 07 promptly
Trainer: John Tsakirgis
To be comfortable with gowning protocol, chemical safety and toxic gas evacuation.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompty
5 FULL Registration Closed  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 1 Register!  
 
Training - Wire bonder training - G12
Trainer: Guixiong Zhong
Basic training to use the wire bonder. This wedge bonder is configured for bonding aluminum wire (.001") to gold.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
         
 
 

CNS USER PROGRAM FAQ

CNS USER PROGRAM MANUAL

Free 2014 CNS Summer Courses. Nanocharacterization and Soft Matter

2014 CNS Nanofabrication Summer School

Free Trainings Announced for new Plate Reader in G05 Biomaterials Lab

08/18/14 to 08/21/14
IEEE Nano 2014 - Toronto

For more News & Events click here!