About the Center for Nanoscale Systems (CNS) at Harvard University- Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- What are Nanoscale Systems? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Origins of CNS - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Mission and Goals - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS Support - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Visitor’s Info - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Administrative Office - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Employment at CNS - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Links - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- News and Events - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS NanoWire - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - How do I become a CNS/NNIN user? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Acknowledgement - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Nanofabrication Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Imaging Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Material Synthesis Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Computation Facilities Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Forms - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - CNS User Fees - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - General User Information and Policy - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - CNS Special Training Sign-up Page - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Social and Ethical Issues in Nanotechnology - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - NNIN Computation Project - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Computation Facilities Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Associated Faculty - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Seed Money Projects - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Visiting Scientist Program - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS/NNIN REU Research - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Research Experience for Teachers (RET) - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Educational Activities - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Videos - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Slides and Presentations - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Publications - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - User Stats - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS in the News - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Scientific News from the World - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - \"Synergy\" Conference website - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems.
   
 
CNS User Info
» Overview
» How do I become a CNS/NNIN user?
» Acknowledgement
» Nanofabrication Facility Use
» Imaging Facility Use
» Material Synthesis Facility Use
» Computation Facilities Use
» Forms
» CNS User Fees
» General User Information and Policy
» CNS Special Training Sign-up Page
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:
select month:
Monday, November 23rd, 2009
Training - FESEM training - B15I
SEM training to use the Ultra55 and Supra55VP FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1 to 4:30 PM 4 1 Register!  
Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 4:30pm 4 FULL Registration Closed  
Training - TEM sample preparation - sample "sandwich" making and wet Diamond Saw - B15A
  Time Max Attendees Available CNS Users ONLY
  11am-12pm 3 FULL Registration Closed  
Training - TEM sample preparation for materials cross sections - disk cutter - B15A
  Time Max Attendees Available CNS Users ONLY
  1-2pm 3 FULL Registration Closed  
Training - Unaxis ICP RIE - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 FULL Registration Closed  
         
 
Tuesday, November 24th, 2009
Training - Asylum AFM - 1st course (basic AFM imaging operation) - LISE-G04
Basic AFM imaging course, including AFM fundamental, cantilever selection, imaging modes, operation procedures and physics behind, and basic imaging processing skills.
please download/read the operation manual on line, http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  10:00am to 12:00pm 4 FULL Registration Closed  
Training - INTRODUCTORY FIB CROSSBEAM (FIB/SEM) TRAINING - B15H
Introduction to the FIB operation of the Crossbeam system by Zeiss. Requires experience with Zeiss SmartSEM software. Must have Zeiss SMARTSEM Training prior to signing up. READ SOP PRIOR TO CLASS.
  Time Max Attendees Available CNS Users ONLY
  1 pm to 5 pm 3 FULL Registration Closed  
Training - LISE clean room orientation - LISE CR (G07); in the hallway
Please bring a copy of the Orientation Form to be filled out from the CNS website. Gowning protocol and tour of the cleanroom are covered. This event takes ~1hr. We meet right in the hallway at G07. Please bring a copy of the Orientation Form to be filled out from the CNS website.
  Time Max Attendees Available Open Event!
  2pm 6 2 Register!  
Training - LISE/CNS Safety Training - LISE 311
Training required for all enrolling CNS/NNIN Users (except NNIN/C Computational Only or Remote Only Users)
  Time Max Attendees Available Open Event!
  10:00am - 12:00pm 12 8 Register!  
Training - STS PECVD - LISE Cleanroom, meet at the tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm - 3:00pm 3 2 Register!  
Training - Thermal evaporator training (TE-3, 4 & 5) - LISE cleanroom (G07); PVD Bay
Use of the Sharon TE-3 for metal thin film deposition is taught. This training takes ~3hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. After the training you will have access to TE-3, 4 and 5.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11am - 2pm 3 2 Register!  
Training - WITec Confocal Raman Microscope - LISE-G04
Basic training course on the WITec confocal Raman microscope, including the basic physics of confocal Raman, the operation procedure, spectrum/imaging process and data analysis skills.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm to 3:30pm 4 3 Register!  
         
 
Wednesday, November 25th, 2009
Training - Metrology tool for Nanofabrication process (1st course) - LISE-G07, Metrology bay in the clean-room
Basic metrology tools training, including Stylus profilometer, Single wavelength Elliosometer, 4 point probe system, Probe station and Electrical measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00am to 12:00pm 4 FULL Registration Closed  
Training - Metrology tool for Nanofabrication process (Advanced course) - LISE-G07, Metrology Bay in the clean-room
Advanced metrology tool training, including JAWoollam Spec. Ellipsometer, Veeco Optical Profiler, or Veeco AFM. Since each tool training may take 1.5~2 hours , user should email JD (jdeng@cns.fas.harvard.edu) to arrange the training schedule after sighing up.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 5:00pm 2 FULL Registration Closed  
         
 
Thursday, November 26th, 2009
Training - Asylum AFM - 2nd course (AFM qualification, and advanced AFM modes) - LISE-G04
Advanced AFM course, including 2 sections:
1) AFM certification. User will operate the AFM and pass the qualification to get the AFM access.
2) Based on the requirement and timing, some advanced AFM techniques will be introduced, including conductive AFM, MFM, Force measurement, fluid AFM, nanolithography...

Note, users have to read through the operation manual of Asylum AFM http://www.cns.fas.harvard.edu/facilities/material_manuals.php
  Time Max Attendees Available CNS Users ONLY
  2:00pm to 4:00 pm 3 2 Register!  
Training - LISE Cleanroom Orientation - LISE G07 (in front of LISE Cleanroom entrance)
This orientation is required in order to become qualified as a CNS LISE Cleanroom User. Please bring the Cleanroom Orientation Form as requested in the Nanofabrication Facility Use page in the User Info section of the CNS web site. Please see that page for the additional requirements for qualification as a CNS LISE Cleanroom User.
  Time Max Attendees Available Open Event!
  12:45-1:45 20 20 Register!  
Training - Safety Training - Materials North Facilities - LISE G04
Training required for all CNS/NNIN Users planning to use the facilities or instruments located in LISE G04, G05 and G06 (Materials North Facilities). This training will be given by John Sweeney, Scott Ide or Evangelos Gatzogiannis on a weekly rotating basis.
IMPORTANT NOTE: This is a general safety orientation for Materials North Facilities only and will not cover specific training on tools, equipment and/or processes in these facilities. Additional training will be needed before starting to use these facilities.
  Time Max Attendees Available CNS Users ONLY
  9:30am-10:30am 10 10 Register!  
         
 
Friday, November 27th, 2009
Training - Disco-Dicing Saw training - LISE-G06
  Time Max Attendees Available CNS Users ONLY
  10:00am -12:00pm 3 3 Register!  
Training - WITec NSOM/AFM advanced training - LISE-G04
Advanced training course on the WITec system, mainly focusing on the near-filed scanning optical microscope (NSOM) and AFM, including the basic physics of NSOM, the operation procedure, data analytical skills... The WITec Raman training is required before this training. It may take 2-4 courses to get the final NSOM certification.
  Time Max Attendees Available CNS Users ONLY
  1:30 - 4:30pm 3 1 Register!  
         
 
Monday, November 30th, 2009
Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30pm to 4:30pm 4 2 Register!  
         
 
 

11/20/09
X-ray MicroCT Seminar and Workshop

11/24/09
NSEC Research Exchange Seminar, "A Diamond Nanowire Single Photon Antenna"
For more News & Events click here!
© 2009 President and Fellows of Harvard College