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CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Thursday, April 24th, 2014
Training - AFM (Asylum) -Part II, qualification - LISE-G12
Trainer: Jiangdong Deng
This 1-to-1 AFM training is the second part of basic training of Asylum AFMs for user to pass the qualification for the AFM access. So, AFM-Part I is prerequisite. 1-to-1 training schedule will be set up before Thursday.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 4:30 pm
4 1 Register!  
 
Training - DelsaNano C Training - Particle Size - LISE G06
Trainer: Fettah Kosar
Beckman Coulter DelsaNano C is a user-friendly dynamic light scattering instrument, which can analyze size as well as zeta potential of nanoparticles (about 1nm - 6um). This training covers the size measurement portion. Zeta potential training can be arranged as a one-on-one assisted session after taking this first training. For more information about our DelsaNano C, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool.php?MID=181
PREREQUISITES: "LISE G06 Room Training" and "CNS Nanoparticle Safety Requirements Form" must be completed prior to attending this training.
http://www.cns.fas.harvard.edu/users/Forms/FM008_r1_3_Pre-Training_Requirements_for_Working_with_Nanoparticles.pdf
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
Meet at the entrance of LISE G06.
2 1 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 2:30 pm
6 4 Register!  
 
Training - Introduction To Photolithography / Contact Aligner Training - Photo bay
Trainer: Amehayesus Gebreyohannes
Training on the use of the MJB3 and MJB4 contact aligners, with a focus on positive resist processes. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class. If you will primarily be working with SU-8, a recommended alternative is "SU-8 process training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:00 pm
4 3 Register!  
 
Training - Leica DM IRB Live Cell Microscope in G05 - LISE G05
Trainer: Monica Zugravu
Learn to use the live cell microscope in G05 for time lapse acquisition with phase contrast or fluorescence.
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 5:00 pm
2 2 Register!  
 
Training - Photolithography (Headway) Spinner Training - meet inside the clean room photo bay
Trainer: Amehayesus Gebreyohannes
Training on the use of the Headway resist spinners. Will cover general operation of the spinners, with a focus on preparing positive resist films. Wet bench training is required before taking this class.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
6 4 Register!  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 1 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
2 2 Register!  
 
         
 
Friday, April 25th, 2014
Training - Advanced training on WiTec NSOM/AFM/Raman system - LISE-G12
Trainer: Jiangdong Deng
This is an advanced training course on the WiTec NSOM/AFM/Raman microscope system. Based on user's request, we will go deeper into this system and explore the capability of near-field optical imaging, AFM, and more. Before take this training, WiTec Raman training is required.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
2 2 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay
Trainer: Amehayesus Gebreyohannes
this is a the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.

Please see the tool webpage for more information on the capabilities of this tool.

Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
3 FULL Registration Closed  
 
Training - X-ray MicroCT Training - LISE G27
Trainer: Fettah Kosar
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.2 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITES - Prior to the training:
1) Complete the "CNS X-Ray Safety Requirements Form" and submit it to CNS Admin Office in LISE 306.
http://www.cns.fas.harvard.edu/users/Forms/FM004_r1_6_Pre-Training_Requirements_MicroCT.pdf
2) Study the "X-ray MicroCT Training Presentation".
http://www.cns.fas.harvard.edu/facilities/docs/X-ray%20MicroCT%20Training%20Presentation%20-%202013-03-19.pdf
3) Bring a paper copy of "SOP086 MicroCT Quick Guide".
http://www.cns.fas.harvard.edu/facilities/docs/SOP086_r7_4_X-Tek%20MicroCT%20Quick%20Guide.pdf
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:30 pm
Meet at the door of LISE G27
2 FULL Registration Closed  
 
         
 
Monday, April 28th, 2014
Training - 3D printing with the Makerbot - LISE G06
Trainer: Arthur McClelland
Learn to use the 3D printer to make objects in ABS or PLA
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
3 2 Register!  
 
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
(check links in confirmation email for documents)
5 5 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
Training - O2 Plasma Stripper system (RIE-5 and RIE-9) - LISE-G07, in the main cleanroom, metrology bay
Trainer: Jiangdong Deng
This training would cover the basic operation procedure of two O2 plasma strippers in the cleanroom .
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 2 Register!  
 
Training - RIE-7 Unaxis RIE training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 2 Register!  
 
Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 3:00 pm
(Please review document links in email confirmation)
5 3 Register!  
 
Training - Zeiss EVO 50 SEM basic operation - LISE B20A
Trainer: Brittany Gelfand
This session will cover the SmartSEM user interface, and practical aspects of generating images on the EVO under high vacuum conditions. The 3 main image generating detectors will be covered, and the importance of the different user-switchable pole-piece apertures used under different vacuum conditions.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 4:00 pm
3 FULL Registration Closed  
 
         
 
Tuesday, April 29th, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Fettah Kosar
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted session that serves as a user qualification on another day. Please bring a copy of the SOP:
http://www.cns.fas.harvard.edu/facilities/docs/SOP001_r2_1_Asylum%20AFM%20User%20Manual.pdf
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 12:30 pm
Please arrive on time!
4 3 Register!  
 
Training - B15A Sample Prep Room Safety Training - LISE B15A
Trainer: Brittany Gelfand
This training is required for access to the sample prep room. It also serves as a pre-requisite for training for other pieces of equipment located in this room. This safety training is separate and different from the LISE safety training.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 10:30 am
12 11 Register!  
 
Training - CNS cleanroom orientation - meet in front of G07
Trainer: John Tsakirgis
To spend some time in clean room familiarizing yourself with safety, tools, wet benches and evacuation procedures.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompt
5 1 Register!  
 
Training - HAR-050 Sputter Coater Training - LISE B15A
Trainer: Brittany Gelfand
This training is required in order to use the sputter coater. Used for creating conductive films for FESEM.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:00 am
6 4 Register!  
 
Training - Introductory FIB-SEM Training - B15H
Trainer: Nicholas Antoniou
Introductory training for Zeiss NVision 40 Crossbeam.
SmartSEM certification is a prerequisite.
READ Crossbeam SOP ahead of training
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
SmartSEM certification is a prerequisite
3 3 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 13 Register!  
 
Training - Nanofabrication Metrology-part-I (Scanning ellipsometer, Dektak, Probe-station, Resmap) - LISE-G07, metrology bay in the cleanroom
Trainer: Jiangdong Deng
This metrology training will cover several basic measurement tools in the cleanroom, including Scanning Ellipsometer, Veeco Dektak Profilometer, Resmap resistance measurement, and probe station with related electronics.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 FULL Registration Closed  
 
Training - RIE-10 SPTS Rapier DRIE - Meet in LISE 319 first and then cleanroom at the tool
Trainer: Ling Xie
The SPTS’s Rapier system etches Si using Bosch switched processing for vertical profiles as well as non-switched processing for tapered profiles. The system is equipped with dual plasma sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets; which results in high etch rate, good uniformity, and less tilting around wafer edge. The Electro-Static Clamping Chuck enables good wafer clamping, less wafer bowing compared with mechanical clamping, and wafer-less chamber cleaning. The attached AMS chiller can control the chuck temperature from -20°C to + 40°C and the Claritas end point detector can minimize the micro-trenches of SOI wafer etch as well as control the pre-etch and the post-etch cleaning.

Application

• Si etch solely
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad features: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handle samples ≤ 6”
• Absolutely no-metal mask or metal stop layer
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
4 3 Register!  
 
Training - Soft Materials Cleanroom training - Meet in front of G07
Trainer: Monica Zugravu
This training will provide the safety requirements and equipment overview inside the Soft Materials Cleanroom and is required for accessing this facility.
  Time Max Attendees Available CNS Users ONLY
  9:30 am - 10:30 am
4 3 Register!  
 
Training - Thermo Scientific K-Alpha XPS Training - G27
Trainer: Hao-Yu (Greg) Lin
Training on the new Thermo XPS system.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
4 FULL Registration Closed  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
Wednesday, April 30th, 2014
Training - Biomaterials Facility G05 room training - LISE G05
Trainer: Monica Zugravu
This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G05. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:00 pm
Turn right when you come out of the elevator and then it's around the corner.
3 3 Register!  
 
Training - Edwards EE-2 e-beam evaporator training - LISE G07 (CNS cleanroom) – PVD Bay
Trainer: Ed Macomber
Edwards EE-2 e-beam evaporator is capable of depositing many oxides and nitrides such as SiO2, Al2O3, TiO2, MgF2, Si3N4, etc., as well as some common metals, if needed. The operating pressure of the system is E-5 to E-6 torr. Users supply their own crucibles and materials for EE-2. The system deposits directionally so that the sidewalls of features are not coated. This makes the system a preferable choice for processing devices that will undergo a lift-off later in the fabrication chain. The training entails going through an entire operating procedure using a mock test sample.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 1:00 pm
(Check confirmation email for document links)
4 2 Register!  
 
Training - Nanofabrication Metrology training-Part 2 (Veeco AFM, and CCI optical profiler) - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This advanced metrology training course will cover Veeco nanoman AFM and CCI optical profiler in the cleanroom.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 5:00 pm
4 FULL Registration Closed  
 
Training - RIE-8 STS RIE training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
Introduction
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.

Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.

Chamber Pre-Cleaning Requirement: Please run “O2PlasmaClean” recipe for 20 min. at the beginning to clean the reactor then run minimum 5 - 10 min the recipe you will use for your samples to pre-condition the reactor.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 4 Register!  
 
Training - SP-3 AJA sputtering system training – 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets to fit their own schedule. After 4 uses (with no problems) users are given 24/7 access.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
(check document links in confirmation email)
5 4 Register!  
 
Training - SU-8 photolithography process training - Meet in the Cleanroom at the photolithography bay (G07)
Trainer: Hao-Yu (Greg) Lin
Training on MJB4 contact aligner with focus on SU-8 photo resist process.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 7 Register!  
 
         
 
 

CNS USER PROGRAM FAQ

04/18/14
CNS Seminar, "Ultra-miniature Lensless Computational Imagers and Sensors"

04/23/14
“AFM and Raman: Collocated Imaging and TERS” hosted by Harvard University Center for Nanoscale Systems.

06/15/14 to 06/18/14
CNS to Host UGIM2014 !!

CNS Job Opening: Nanofab Technician

For more News & Events click here!