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CNS User Info
» Overview
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» Acknowledgement
» Nanofabrication Facility Use
» Imaging Facility Use
» NanoMaterials Facility Use
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» General User Information and Policy
» Training Sign-up
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Wednesday, August 20th, 2014
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 2 Register!  
 
Training - AS200 i-line stepper training-Part I - Meet in the photolithography bay of the cleanroom.
Trainer: Guixiong Zhong
This is the first part of a two part stepper training. System overview, job making, editing, reticle loading, automatic wafer loading, wafer stepping, and unloading will be covered in the training. Please see the tool webpage for more information on the capabilities of this tool.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 4 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR in transmission, variable angel specular reflection, or ATR mode.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 1 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Cleanroom
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - RIE-8 STS RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.

Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay
Trainer: Amehayesus Gebreyohannes
this is a the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.

Please see the tool webpage for more information on the capabilities of this tool.

Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
3 FULL Registration Closed  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 4 Register!  
 
         
 
Thursday, August 21st, 2014
Seminar - Asylum Research AFM Workshop and Tutorials - Haller Hall Room 102
Trainer: Jason Tresback
Asylum Research AFM Workshop and Tutorials
Harvard University CNS, Aug. 21-22, 2014

Come Learn About New AFM Developments for Nanomechanical and Nanoelectrical Measurements

AFM is experiencing an evolution with new techniques and instrumentation for nanomechanical and nanoelectrical measurements. This workshop will discuss results from leading AFM scientists in their respective fields of materials and bioscience. New techniques and modes will be demonstrated live and in tutorials on the Asylum Research Cypher ES™ Environmental AFM. The workshop is ideal for both novice and experienced AFM users.

Invited Speakers
Kathy Aidala, Mount Holyoke
Tom Arruda, Salve Regina University
Bryan Huey, Univ. of Connecticut
Cristian Staii, Tufts Univ.
Matt Whitfield, MIT
Dalia Yablon, SurfChar LLC
Rob Cain, Nicholas Geisse, and Keith Jones,
Oxford Instruments Asylum Research, Inc.

Location
Harvard University, Haller Hall, Room 102
Oxford St., Cambridge, MA 02138

Registration
Aug. 21: Free lectures and demonstrations to all attendees
Aug. 22: Tutorials on instruments (small groups), $25 registration fee for each tutorial
9:00-10:30 Overview of Nanomechanical Characterization with AFM: Resonant and Non-resonant Methods
11:00- 11:50 Electrical Characterization Methods

Lunch will be provided on Aug. 21. Registration can be found at www.asylumresearch.com/HW or email Nushaw.Ghofranian@oxinst.com to register. Limited seating is available and all attendees must register. Anyone not registered prior to the workshop cannot be guaranteed a seat.
  Time Max Attendees Available Open Event!
  8:30 am - 5:00 pm
70 51 Register!  
 
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
(check links in confirmation email for documents)
5 3 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Supra and Ultra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 1 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 2:00 pm
6 6 Register!  
 
Training - Introduction to TEM 2 part session. Part 1 Aug 21st part 2 Aug 22nd Both from 9:00-1:00 - B15C
Trainer: Adam Graham
in this training you will learn to use the JEOL 2100. We will go over start up, Alignment HRTEM and how to shut down the microscope. Access will be granted after successful completion of both session and a certification session.
  Time Max Attendees Available CNS Users ONLY
  9:00 am - 4:00 pm
both sessions are required. Part 1 Aug 21st part 2 aug 22nd. Both from 9:00-1:00
4 1 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Please meet in front of G 07 promptly
Trainer: John Tsakirgis
To be comfortable with gowning protocol, chemical safety and toxic gas evacuation.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompty
5 3 Register!  
 
Training - SP-3 AJA sputtering system training – 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets to fit their own schedule. After 4 uses (with no problems) users are given 24/7 access.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  4:00 pm - 5:00 pm
(check document links in confirmation email)
4 4 Register!  
 
Training - X-ray MicroCT Training - LISE G27 - LISE G27
Trainer: Monica Zugravu
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.2 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITES - Prior to the training:
1) Complete the "CNS X-Ray Safety Requirements Form" and submit it to CNS Admin Office in LISE 306.
http://www.cns.fas.harvard.edu/users/Forms/FM004_r1_6_Pre-Training_Requirements_MicroCT.pdf
2) Study the "X-ray MicroCT Training Presentation".
http://www.cns.fas.harvard.edu/facilities/docs/X-ray%20MicroCT%20Training%20Presentation%20-%202013-03-19.pdf
3) Bring a paper copy of "SOP086 MicroCT Quick Guide".
http://www.cns.fas.harvard.edu/facilities/docs/SOP086_r7_4_X-Tek%20MicroCT%20Quick%20Guide.pdf
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 3 Register!  
 
         
 
Friday, August 22nd, 2014
Training - AS200 i-line stepper training-Part II -
Trainer: Guixiong Zhong
This is the second part of a two part stepper training. Manual loading, unloading, aligning, and basic overlay strategy will be covered. The prerequisite is AS200 i-line stepper training-Part I.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 3 Register!  
 
Training - Nanofabrication Cleanroom Optical Microscope Training (Visible and IR) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This training event will cover basic operations of the various optical microscopes and digital cameras available inside the Nanofabrication Cleanroom. There are five independent systems consisting of Nikon L200, Nikon Optiphot 150 and Optiphot 66, and two Olympus BX51s. These are equipped with two Nikon CCD cameras, a Motic camera, an Xfinity 1 CCD camera, and a Q-imaging IR camera. The systems contain 2.5x to 150x objectives, BF/DF modes, reflective/transmission modes, and the Optiphot 150 has a NWL-641 Auto Loader for 4 and 6” wafer cassettes.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 1 Register!  
 
Training - SEM training part 1 - LISE 303
Trainer: Dave Lange
Introduction to using the SEM including basic background and detectors available on the SEMs at CNS.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
15 9 Register!  
 
         
 
Monday, August 25th, 2014
Training - Biomaterials Facility G05 room training - LISE G05
Trainer: Monica Zugravu
This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G05. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:00 pm
Turn right when you come out of the elevator and then it's around the corner.
3 3 Register!  
 
Training - Disco ADA-321 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G06
Trainer: Jason Tresback
This training event will cover the basic operation of the Disco ADA-321 Automatic Dicing Saw (SW-1). The tool uses a rotating, ultra-thin (100-300 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, sapphire, ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day, AND completion of the LISE G06 Room Safety Training event. Please register for each event.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 5:00 pm
3 3 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Supra and Ultra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 FULL Registration Closed  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 3 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
Training - O2 Plasma Stripper system (RIE-5 and RIE-9) - LISE-G07, in the main cleanroom, metrology bay
Trainer: Jiangdong Deng
This training would cover the basic operation procedure of two O2 plasma strippers in the cleanroom .
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
Training - VersaLaser training - LISE G06
Trainer: Monica Zugravu
This training will provide basic instructions and a demo on using the cutting and engraving system VersaLaser 3.50
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 3:30 pm
3 1 Register!  
 
Training - Zeiss EVO 50 SEM basic operation - LISE B20A
Trainer: Brittany Gelfand
This session will cover the SmartSEM user interface, and practical aspects of generating images on the EVO under high vacuum conditions. The 3 main image generating detectors will be covered, and the importance of the different user-switchable pole-piece apertures used under different vacuum conditions.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 4:00 pm
3 2 Register!  
 
         
 
Tuesday, August 26th, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 3 Register!  
 
Training - B15A Sample Prep Room Safety Training - LISE B15A
Trainer: Brittany Gelfand
This training is required for access to the sample prep room. It also serves as a pre-requisite for training for other pieces of equipment located in this room. This safety training is separate and different from the LISE safety training.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 10:30 am
12 8 Register!  
 
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 Confocal microscope
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 12:00 pm
3 2 Register!  
 
Training - Cambridge Nanotech Atomic Layer Deposition Training - Gowning area - G-07 Cleanroom (Meet in GOWNING AREA)
Trainer: Mac Hathaway
Training on the ALD oxide system

For Metals and Nitrides, you will need to use the Gemstar - ALD-2
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 11:00 am
4 3 Register!  
 
Training - Contact Angle and Surface Tension Measurement System Training - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
The FTA100 series contact angle and surface tension measurement system uses video-based software to analyze drop shape without operator error. The manual stage can accommodate up to 200mm wafers and liquid can be dispensed with a fixed volume using syringe pipette.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  4:00 pm - 5:00 pm
3 3 Register!  
 
Training - CVD - 2 Nexx PECVD System - Dry Processing Bay - LISE Cleanroom
Trainer: Philippe de Rouffignac
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, Ar, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:00 pm
Established SiO2, Si3N4, low-stress Si3N4, and amorphous Si film deposition conditions and results are listed in the Nexx PECVD Logbook.
3 3 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 2:30 pm
4 4 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Supra and Ultra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 2 Register!  
 
Training - HAR-050 Sputter Coater Training - LISE B15A
Trainer: Brittany Gelfand
This training is required in order to use the sputter coater. Used for creating conductive films for FESEM.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:00 am
6 1 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating , Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes. Wet bench training is required for this session.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
6 FULL Registration Closed  
 
Training - LPCVD and APCVD Training - Dry-Processing Bay
Trainer: Philippe de Rouffignac
Training for all 6 furnaces of the Tystar System
(SiNx, Poly, TEOS, Oxidation, non-metal anneal, metal anneal) CVD 5,6,7,9,10,11
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:30 am
4 FULL Registration Closed  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 5 Register!  
 
Training - OL 770-LED Test and Measurement System Training -
Trainer: Jason Tresback
The OL 770-LED Test and Measurement System (MET-13) is a high-speed, CCD-based spectro-radiometer that can be used to measure 2-pin/wire electroluminescent devices to determine total radiant flux, total luminous and spectral flux, total power, dominant wavelength, spectral purity, correlated color temperature, peak wavelength, color rendering index, and chromaticity. There is currently one standard LED holder and K2400 source meter to provide constant current or voltage (input power) and measure total light output power. We meet outside LISE G27 in hallway
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
3 3 Register!  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 3 Register!  
 
Training - RCA Clean station - meet inside cleanroom in front of wet bay
Trainer: John Tsakirgis
To understand the operation and safety pof the RCA Station at CNS
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt and bring cleanroom notebook
5 5 Register!  
 
Training - Soft Materials Cleanroom training - Meet in front of G07
Trainer: Monica Zugravu
This training will provide the safety requirements and equipment overview inside the Soft Materials Cleanroom and is required for accessing this facility.
  Time Max Attendees Available CNS Users ONLY
  9:30 am - 10:30 am
4 4 Register!  
 
Training - SPECTRO XRF Training - G27
Trainer: Hao-Yu (Greg) Lin
Training on the XRF system.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 12:30 pm
2 2 Register!  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
Wednesday, August 27th, 2014
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 2 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR in transmission, variable angel specular reflection, or ATR mode.
  Time Max Attendees Available CNS Users ONLY
  11:00 am - 12:00 pm
3 3 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - RIE-1 SouthBay Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
A parallel plate low density plasma reactor with available gases of SF6, CF4, CHF3, O2, and Ar. This RIE is able to etch Si, SiO2, Si3N4, W, Ti, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:30 pm - 4:30 pm
4 3 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 8 Register!  
 
Training - XeF2 Etcher training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Isotropic etching of Si.
  Time Max Attendees Available CNS Users ONLY
  4:00 pm - 4:30 pm
4 4 Register!  
 
         
 
Thursday, August 28th, 2014
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 3 Register!  
 
Training - DelsaNano C Training - Particle Size - LISE G06 - LISE G06
Trainer: Monica Zugravu
Beckman Coulter DelsaNano C is a user-friendly dynamic light scattering instrument, which can analyze size, as well as zeta potential of nanoparticles (about 1nm - 6um). This training covers the size measurement portion. Zeta potential training can be arranged as a one-on-one assisted session after taking this first training. For more information about our DelsaNano C, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool.php?MID=181
PREREQUISITES: "LISE G06 Room Training" and "CNS Nanoparticle Safety Requirements Form" must be completed prior to attending this training.
http://www.cns.fas.harvard.edu/users/Forms/FM008_r1_3_Pre-Training_Requirements_for_Working_with_Nanoparticles.pdf
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 4:30 pm
2 2 Register!  
 
Training - Finetech Flip Chip Bonder - G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder. Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection. During the bonding process, both chip and substrate are typically heated to an alloying temperature of the interconnect material.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:30 pm
4 3 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker Lumos in Transmission, ATR, and Reflection modes.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 2:00 pm
6 6 Register!  
 
Training - Leica DM IRB Live Cell Microscope in G05 - LISE G05
Trainer: Monica Zugravu
Learn to use the live cell microscope in G05 for time lapse acquisition with phase contrast or fluorescence.
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 5:00 pm
2 2 Register!  
 
Training - LSD-100 Scriber/Cleaver for III-V materials - G12
Trainer: Guixiong Zhong
Basic training to use the scriber/cleaver.
  Time Max Attendees Available CNS Users ONLY
  4:30 pm - 5:00 pm
4 4 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Please meet in front of G 07 promptly
Trainer: John Tsakirgis
To be comfortable with gowning protocol, chemical safety and toxic gas evacuation.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompty
5 5 Register!  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 2 Register!  
 
Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:30 pm
(Please review document links in email confirmation)
4 4 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
2 2 Register!  
 
Training - Wire bonder training - G12
Trainer: Guixiong Zhong
Basic training to use the wire bonder. This wedge bonder is configured for bonding aluminum wire (.001") to gold.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 3 Register!  
 
         
 
Friday, August 29th, 2014
Training - Advanced training on WiTec NSOM/AFM/Raman system - LISE-G12
Trainer: Jiangdong Deng
This is an advanced training course on the WiTec NSOM/AFM/Raman microscope system. Based on user's request, we will go deeper into this system and explore the capability of near-field optical imaging, AFM, and more. Before take this training, WiTec Raman training is required.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
2 FULL Registration Closed  
 
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Nanofabrication Cleanroom Optical Microscope Training (Visible and IR) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This training event will cover basic operations of the various optical microscopes and digital cameras available inside the Nanofabrication Cleanroom. There are five independent systems consisting of Nikon L200, Nikon Optiphot 150 and Optiphot 66, and two Olympus BX51s. These are equipped with two Nikon CCD cameras, a Motic camera, an Xfinity 1 CCD camera, and a Q-imaging IR camera. The systems contain 2.5x to 150x objectives, BF/DF modes, reflective/transmission modes, and the Optiphot 150 has a NWL-641 Auto Loader for 4 and 6” wafer cassettes.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 3 Register!  
 
         
 
 

CNS USER PROGRAM FAQ

CNS USER PROGRAM MANUAL

08/14/14 to 08/15/14
3D Raman Imaging and Correlative Scanning Microscopy Workshop

08/18/14 to 08/21/14
IEEE Nano 2014 - Toronto

08/21/14 to 08/22/14
Asylum Research AFM Workshop and Tutorials

Free 2014 CNS Summer Courses. Nanocharacterization and Soft Matter

2014 CNS Nanofabrication Summer School

Free Trainings Announced for new Plate Reader in G05 Biomaterials Lab

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