About the Center for Nanoscale Systems (CNS) at Harvard University- Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- What are Nanoscale Systems? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Origins of CNS - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Mission and Goals - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS Management - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Visitor’s Info - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Administrative Office - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- Links - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- News and Events - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. About the Center for Nanoscale Systems (CNS) at Harvard University- CNS NanoWire - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - How do I become a CNS/NNIN user? - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Acknowledgement - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Nanofabrication Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Imaging Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - NanoMaterials Facility Use - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Forms - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - CNS User Fees - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - General User Information and Policy - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN users - Training Sign-up - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN - Social and Ethical Issues in Nanotechnology - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Overview - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Associated Faculty - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS/NNIN REU Research - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Research Experience for Teachers (RET) - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Educational Activities - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Videos - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Slides and Presentations - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS Publications - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - User Stats - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - CNS in the News - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems. CNS/NNIN Research - Scientific News from the World - Harvard Nanoscale, Nanotechnology, HU, fabrication and construction of nanoscale systems.
   
 
CNS User Info
» Overview
» How do I become a CNS/NNIN user?
» Acknowledgement
» Nanofabrication Facility Use
» Imaging Facility Use
» NanoMaterials Facility Use
» Forms
» CNS User Fees
» General User Information and Policy
» Training Sign-up
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Date TBD - you can pre-register for this training session
CNS staff will notify you when a date has been set.
Training - Focused Ion Beam (FIB/SEM) Training Waitlist -
Trainer: Andrew Magyar
A wait list for training on the new FEI FIB/SEM. Please email me, amagyar@cns.fas.harvard.edu and I will add you to the list
  Time Max Attendees Available CNS Users ONLY
  99 92 Pre-Register!  
 
         
 
Tuesday, November 25th, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 2 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating , Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes. Wet bench training is required for this session.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 8 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 FULL Registration Closed  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 2 Register!  
 
Training - RIE-10 SPTS Rapier DRIE - Meet in LISE 319 for the first hour
Trainer: Ling Xie
The SPTS’s Rapier system etches Si using Bosch switched processing for vertical profiles as well as non-switched processing for tapered profiles. The system is equipped with dual plasma sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets; which results in high etch rate, good uniformity, and less tilting around wafer edge. The Electro-Static Clamping Chuck enables good wafer clamping, less wafer bowing compared with mechanical clamping, and wafer-less chamber cleaning. The attached AMS chiller can control the chuck temperature from -20°C to + 40°C and the Claritas end point detector can minimize the micro-trenches of SOI wafer etch as well as control the pre-etch and the post-etch cleaning.

Application

• Si etch solely
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad features: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handle samples ≤ 6”
• Absolutely no-metal mask or metal stop layer
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
4 2 Register!  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - X-ray MicroCT Training - LISE G27
Trainer: Fettah Kosar
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.2 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITES - Prior to the training:
1) Complete the "CNS X-Ray Safety Requirements Form" and submit it to CNS Admin Office in LISE 306.
http://www.cns.fas.harvard.edu/users/Forms/FM004_r1_6_Pre-Training_Requirements_MicroCT.pdf
2) Study the "X-ray MicroCT Training Presentation".
http://www.cns.fas.harvard.edu/facilities/docs/X-ray%20MicroCT%20Training%20Presentation%20-%202013-03-19.pdf
3) Bring a paper copy of "SOP086 MicroCT Quick Guide".
http://www.cns.fas.harvard.edu/facilities/docs/SOP086_r7_4_X-Tek%20MicroCT%20Quick%20Guide.pdf
  Time Max Attendees Available CNS Users ONLY
  9:00 am - 12:30 pm
Meet at the door of LISE G27
2 FULL Registration Closed  
 
         
 
Wednesday, November 26th, 2014
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 2 Register!  
 
Training - CVD-13 PECVD Diamond Seki System - G27
Trainer: Philippe de Rouffignac
Microwave plasma system designed to grow diamond films from an existing diamond surface (nanoparticle or film). This tool can also be used for hydrogen plasma treatment and for carbon nanotube growth (contact tool owner if interested in CNTs; not automatically available to every user)
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 1 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 1 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 2 Register!  
 
Training - RIE-8 STS RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.

Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
5 FULL Registration Closed  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 3 Register!  
 
         
 
Thursday, November 27th, 2014
Training - ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - LISE CNS Cleanroom (G07) Wet Processing Bay
Trainer: Philippe de Rouffignac
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 - 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
5 4 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
2 FULL Registration Closed  
 
         
 
Friday, November 28th, 2014
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
         
 
 

Help Wanted: Positions available at LightSpin Technologies

CNS USER PROGRAM FAQ

CNS USER PROGRAM MANUAL

For more News & Events click here!