CNS Training Sign-Up - Center for Nanoscale Systems - Harvard University - Cambridge, MA - Nanotechnology, fabrication and construction of nanoscale systems

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CNS Training Events - Registration Page

Registration is currently open for the following training sessions:

select month:

Monday, May 20th, 2013

Training - Biological Materials Facility room training - LISE G05 Trainer: Arthur McClelland This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility. Please be on time.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 2:00 pm Turn right when you come out of the elevator and then it's around the corner.	5	4	Register!

Training - Biological Materials Facility room training - LISE G05 Trainer: Monica Zugravu This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G05. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 2:00 pm Turn right when you come out of the elevator and then it's around the corner.	5	5	Register!

Training - Disco ADA-321 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G06 Trainer: Jason Tresback This training event will cover the basic operation of the Disco ADA-321 Automatic Dicing Saw. The tool uses a rotating, ultra-thin (100-300 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, sapphire, ceramics, etc. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session on another day, AND completion of the LISE G06 Room Safety Training event. Please register for each event.
	Time	Max Attendees	Available	CNS Users ONLY
	3:30 pm - 5:00 pm	3	2	Register!

Training - Electrical Characterization Part 1- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27 Hallway Trainer: Jason Tresback This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Full tool access will require completion of Electrical Characterization Part-1 followed by at least one user assisted session that serves as an individual user qualification. Temperature dependent measurements in the range of 100K to 700K can be investigated with staff assistance only. Email (jtresback@cns.fas.harvard.edu) if you have any questions, we meet in the hallway outside LISE G27.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 3:00 pm	3	3	Register!

Training - Nanofabrication Process integration, trouble-shooting, and free discussion - LISE-G54, JD's office Trainer: Jiangdong Deng Based on user's request, this is a free discussion session, and try to help user on any question and issues met in nanofabrication process (design, integration, trouble-shooting).
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	2:00 pm - 3:00 pm	1	1	Register!

Training - RIE-5 Technics & RIE-9 Anatech training - LISE CNS Cleanroom G 07 at the tool Trainer: Ling Xie O2-Plasma surface cleaning and resist stripping
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	3:00 pm - 4:00 pm	6	4	Register!

Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07) Trainer: Ed Macomber E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 3:00 pm (Please review document links in email confirmation)	4	1	Register!

Training - VersaLaser Training - LISE G06 Trainer: Monica Zugravu This training will cover the basic operation of the VersaLaser Cutting/Engraving System located in the Soft Lithography Foundry in LISE G06. The prerequisites to access this room include the General Safety training and G06 room training. If you bring new materials to CNS, please fill the CNS Materials Request Form, which is found under User info>Forms on the CNS website.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 3:00 pm LISE G06	3	3	Register!

Tuesday, May 21st, 2013

Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12 Trainer: Jason Tresback This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted qualification on another day. Please register for each event.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 12:00 pm	5	FULL	Registration Closed

Training - B15A Safety Training - LISE B15A Trainer: Andrew Magyar Safety training to enter or use any equipment in B15A.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 10:30 am	10	7	Register!

Training - Basic fluorescence confocal microscopy - LISE G04 Trainer: Arthur McClelland Learn to use the Olympus FV300 laser scanning confocal system with 405, 488, 543, and 632 nm lines. 3D reconstruction of data using ImageJ is also covered. This training is also required for second harmonic generation imaging, two photon fluorescence imaging, or coherent anti-stokes Raman imaging.
	Time	Max Attendees	Available	CNS Users ONLY
	10:30 am - 12:00 pm	3	3	Register!

Training - Cleanroom Orientation (Nanofabrication)- Tuesday - LISE-G07, outside the cleanroom door Trainer: Jiangdong Deng Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others.
	Time	Max Attendees	Available	Open Event!
	3:30 pm - 4:30 pm	5	5	Register!

Training - Contact angle measurement - LISE G06 Trainer: Arthur McClelland Learn to use the static contact angle setup to help characterized surface free energy of samples.
	Time	Max Attendees	Available	CNS Users ONLY
	3:30 pm - 4:00 pm	3	3	Register!

Training - Fourier Transform Infrared (FTIR) Spectoscopy - LISE G04 Trainer: Arthur McClelland FTIR is a vibrational spectroscopy technique used primarily for chemical identification. Transmission, variable angle specular reflection, variable polarization, and attenuated total reflectance (ATR-FTIR) techniques are all covered.
	Time	Max Attendees	Available	CNS Users ONLY
	1:00 pm - 2:00 pm Feel free to bring a sample to test	3	FULL	Registration Closed

Training - LISE G04 orientation and safety training - LISE G04 Trainer: Arthur McClelland Lab orientation and safety training required for access to the LISE G04 optics lab.
	Time	Max Attendees	Available	CNS Users ONLY
	12:00 pm - 12:30 pm	5	2	Register!

Training - LISE/CNS Safety Training - LISE 311 Trainer: Jim Reynolds This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are those who are going to be NNIN/C computational users ONLY or Remote Only Users. This training can be taken prior to turning in your enrollment paperwork.
	Time	Max Attendees	Available	Open Event!
	9:30 am - 12:00 pm For map showing LISE Building see: map.harvard.edu	14	7	Register!

Training - LPCVD and Atmospheric CVD Training - LISE Cleanroom - Dry Processing Bay Trainer: Philippe de Rouffignac This training encompasses operation and process notes for the Tystar LPCVD and atmospheric furnaces. These include the following: TEOS (SiO2), Si3N4, amorphous and poysilicon (doped and undoped), Wet and dry atmospheric oxidation, metal anneal and non-metal anneal. Note: You must have taken RCA clean training prior to this one.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 12:00 pm	4	2	Register!

Training - Soft Materials Cleanroom training - LISE G07 Trainer: Monica Zugravu Safety concerns and a brief description of equipment will be discussed. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G07.
	Time	Max Attendees	Available	CNS Users ONLY
	9:30 am - 10:30 am	5	2	Register!

Training - Sputter coater training (HAR-024) - LISE B15A Trainer: Andrew Magyar Training to use the Sputter Coater in B15A (HAR-024). This tool is used to deposit thin layers (10s of nm) of Au, Cr, and Pt-Pd on samples to improve sample conductivity for electron microscopy. Trainees may bring a sample to coat. Please note that B15A Safety Training is needed to use the Sputter Coater (available at 10 AM).
	Time	Max Attendees	Available	CNS Users ONLY
	10:30 am - 11:00 am	4	1	Register!

Training - WiTec Confocal Raman Microscope Trainining - LISE-G12 Trainer: Jiangdong Deng This training will cover the basic principle and operation procedure of WiTec Confocal Raman Microscope system.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:00 pm	4	3	Register!

Wednesday, May 22nd, 2013

Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12 Trainer: Jiangdong Deng In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 3:30 pm	2	2	Register!

Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay Trainer: Ed Macomber Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. These are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 2:00 pm (check links in confirmation email for documents)	4	FULL	Registration Closed

Training - FESEM training part 2 (prerequisite SEM training part 1) - B15D Trainer: Dave Lange Basic training to use the Ultra and Supra FESEMs
	Time	Max Attendees	Available	CNS Users ONLY
	1:00 pm - 5:00 pm	4	FULL	Registration Closed

Training - Heidelberg DWL66 Maskwriter Training - Part 1 - Meet at the DWL66, in the photolithography bay of the cleanroom. Please be prompt Trainer: Steven Hickman Training on the Heidelberg DWL66 Mask writer - please see the tool webpage for more information on the capabilities of this tool. This is a the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted. Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:00 pm	3	1	Register!

Training - Heidelberg uPG501 Direct-Write lithography training - Meet in the metrology bay of the cleanroom. Please be prompt. Trainer: Steven Hickman Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 2:30 pm	4	2	Register!

Training - MA6 mask aligner training - Meet at the MA6, in the photolithography bay of the cleanroom. Please be prompt Trainer: Steven Hickman Training on the MA6 mask aligner. Headway spinner training is a prerequisite for this event, as is training on and familiarity with the MJB4 mask aligner, or another MA6 mask aligner.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	3:00 pm - 4:00 pm	5	FULL	Registration Closed

Training - Metrology for Nanofabrication Part-1 (Contact Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Trainer: Jason Tresback This metrology training event will focus on fundamental measurement tools for nanofabrication including, contact/surface Profilometer (Veeco DekTek 6m), single wavelength scanning Ellipsometer (Gaertner-LSE), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station). Full access to the tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:00 pm	5	FULL	Registration Closed

Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Trainer: Jason Tresback This training event covers some advanced metrology techniques, such as Optical Profiler (Wyko NT1100 and CCI HD) (PL-2/6) and Atomic Force Microscopy (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the course, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full access to the Atomic Force Microscope (SPM-5) will require at least one individual user assisted session on a separate day. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	3:00 pm - 5:00 pm	3	FULL	Registration Closed

Training - SU-8 process training - Meet in the photolithography bay of the main cleanroom G07 Trainer: Hao-Yu (Greg) Lin Training on the use of MJB4 contact aligners, with a focus on SU-8 resist process. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:00 pm	4	3	Register!

Training - Wetbench Use and Safety Training - OUTSIDE the entrance to CNS Cleanroom (G-07). (YES, we meet OUTSIDE in the HALL) Trainer: Mac Hathaway Wetbench Safety Training
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:30 pm	8	2	Register!

Thursday, May 23rd, 2013

Training - Atomic Force Microscopy Part-2 Individual User Qualification (MFP3D -AFM) - LISE G12 Trainer: Jason Tresback This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by at least one user assisted session on another day that serves as an individual user qualification, and users are encouraged to bring a sample.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 5:00 pm	3	1	Register!

Training - Cleabroom Orientation (Nanofabrication)-Thursday - LISE-G07, outside the cleanroom door Trainer: Jiangdong Deng Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others.
	Time	Max Attendees	Available	Open Event!
	2:30 pm - 4:00 pm	5	5	Register!

Seminar - CNS LUNCH SEMINAR: Tunable Resistive Pulse Sensors for High Resolution Nano/Micro-Particle Analysis - LISE 303 Trainer: Fettah Kosar Accurate high resolution characterization of complex systems such as viruses, microvesicles and drug delivery particles is critical to understanding their function and optimization. Tunable resistive pulse sensors (TRPS) have generated considerable interest for their ability to accurately characterize the size, charge and concentration of nano to micro-scale particulate suspensions. Measuring the properties of each particle as is passes through the elastic pore sensor provides high resolution analysis often beyond that of other analysis techniques. Furthermore, the recently developed capability to simultaneously measure the size and charge on a particle-by-particle basis provides a unique method to better characterize and understand the role that these properties play. The fundamental principles behind TRPS and how it has been used to improve the characterization of particle size, charge and concentration within complex (e.g. polydisperse or multimodal size and charge) suspensions will be discussed. These techniques have been used to characterize a wide range of synthetic and biological particle systems including adenovirus, exosomes, DNA coated particles, Baculovirus occlusion bodies, and Prochlorococcus as well as study the surface modification, aggregation, and storage effects on liposomes. SPEAKER BIOGRAPHY: Dr. Darby Kozak is the Chief Scientist for Izon Science US, where he is in charge of developing new analysis capabilities and applications for the suite of Izon instruments. He was recently selected as an as an ‘Emerging Leader in Colloid and Interface Science’ by the Colloid division of the Royal Australian Chemical Institute and has authored 23 articles, a book chapter, and has presented at over 15 international conferences. Darby gained his BSc in Chemical Engineering from the University of Washington, USA in 2001 and his PhD in 2005 from the University of Bristol, UK where he studied non-ionic surfactants for stabilizing non-aqueous colloidal dispersions.
	Time	Max Attendees	Available	Open Event!
	11:00 am - 2:00 pm Seminar: 11:00am Lunch: 12:00pm Instrument Demo: 12:30pm	40	27	Register!

Training - CVD-2 Nexx ECR PECVD Training - Trainer: Ling Xie NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:30 pm - 3:00 pm	4	FULL	Registration Closed

Training - DelsaNano C Training - Particle Size - LISE G06 Trainer: Fettah Kosar Beckman Coulter DelsaNano C is a user-friendly dynamic light scattering instrument, which can analyze size as well as zeta potential of nanoparticles (about 1nm - 6um). This training covers the size measurement portion. Zeta potential training can be arranged as a one-on-one assisted session after taking this first training. For more information about our DelsaNano C, please visit the instrument's webpage at: http://www.cns.fas.harvard.edu/facilities/tool.php?MID=181 PREREQUISITES: "LISE G06 Room Training" and "CNS Nanoparticle Safety Requirements Form" must be completed prior to attending this training. http://www.cns.fas.harvard.edu/users/Forms/FM008_r1_3_Pre-Training_Requirements_for_Working_with_Nanoparticles.pdf
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:30 pm Meet at the entrance of LISE G06.	2	1	Register!

Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06 Trainer: Monica Zugravu Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
	Time	Max Attendees	Available	CNS Users ONLY
	11:30 am - 12:00 pm	5	5	Register!

Training - Introduction to Photolithography/Contact Aligner Training - Meet in the photolithography bay of the cleanroom - please be prompt! Trainer: Steven Hickman Training on the use of the MJB3 and MJB4 contact aligners, with a focus on positive resist processes. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class. If you will primarily be working with SU-8, a recommended alternative is "SU-8 process training".
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 2:30 pm	4	2	Register!

Training - Photolithography (Headway) Spinner Training - Meet in the photolithography bay of the cleanroom - please be prompt! Trainer: Steven Hickman Training on the use of the Headway resist spinners. Will cover general operation of the spinners, with a focus on preparing positive resist films. Wet bench training is required before taking this class.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	9:00 am - 11:00 am	6	4	Register!

Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool Trainer: Ling Xie NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	3:00 pm - 4:30 pm	4	3	Register!

Training - Soft Lithography training - G06 Trainer: Hao-Yu (Greg) Lin Training on all tools at Soft Lithography Foundry located in G06, including UV Flood Exposure System, KLA-Tencor P-16+ Contact Stylus Profiler, Thinky Mixer, Plasma Prep II and Xerox Wax Printer. Please complete the LISE G06 Room Safety Training before this class.
	Time	Max Attendees	Available	CNS Users ONLY
	2:30 pm - 4:30 pm	2	2	Register!

Friday, May 24th, 2013

Training - Advanced training on WiTec NSOM/AFM/Raman system - LISE-G12 Trainer: Jiangdong Deng This is an advanced training course on the WiTec NSOM/AFM/Raman microscope system. Before take this training, WiTec Raman training is required.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 3:30 pm	2	2	Register!

Training - Disco ADA-321 Automatic Dicing Saw Training Part 2-User Qualification - LISE G06 Trainer: Jason Tresback This training event will allow individual users to operate the dicing saw with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own samples, otherwise a one will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by individual User qualification on another day, AND completion of the LISE G06 Room Safety Training events. Please register for each event.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 5:00 pm	3	2	Register!

Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay Trainer: Jiangdong Deng This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:00 pm	4	1	Register!

Training - RIE-1 SouthBay RIE - LISE CNS Cleanroom G 07 in Dry Processing Bay Trainer: Ling Xie The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6� sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar. It can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	11:00 am - 12:00 pm	4	FULL	Registration Closed

Training - SEM training part 1 - LISE 303 Trainer: Dave Lange Introduction to using the SEM. Lecture will discuss the SEMs available at CNS (EVO conventional SEM and the Supra and Ultra FESEMs) and the detectors available on them.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:30 pm	12	2	Register!

Monday, May 27th, 2013

Training - Biological Materials Facility room training - LISE G05 Trainer: Monica Zugravu This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G05. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 2:00 pm Turn right when you come out of the elevator and then it's around the corner.	5	5	Register!

Training - Nanofabrication Process integration, trouble-shooting, and free discussion - LISE-G54, JD's office Trainer: Jiangdong Deng Based on user's request, this is a free discussion session, and try to help user on any question and issues met in nanofabrication process (design, integration, trouble-shooting).
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	2:00 pm - 3:00 pm	1	1	Register!

Training - RIE-7 Unaxis RIE training - LISE CNS Cleanroom G 07 at the tool Trainer: Ling Xie Applications: This tool will be dedicated to III-V compound semiconductor material etchings. Features: ICP plasma generator Load-lock End point detector Substrate temperature control unit Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2 Sample size: 6” or smaller Processes: Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:30 pm - 3:00 pm	4	3	Register!

Training - RIE-7 Unaxis RIE training - LISE CNS Cleanroom G 07 at the tool Trainer: Ling Xie Applications: This tool will be dedicated to III-V compound semiconductor material etchings. Features: ICP plasma generator Load-lock End point detector Substrate temperature control unit Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2 Sample size: 6” or smaller Processes: Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 3:00 pm	4	4	Register!

Tuesday, May 28th, 2013

Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12 Trainer: Jason Tresback This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted qualification on another day. Please register for each event.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 12:00 pm	5	1	Register!

Training - B15A Safety Training - LISE B15A Trainer: Andrew Magyar Safety training to enter or use any equipment in B15A.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 10:30 am	10	9	Register!

Training - Basic fluorescence confocal microscopy - LISE G04 Trainer: Arthur McClelland Learn to use the Olympus FV300 laser scanning confocal system with 405, 488, 543, and 632 nm lines. 3D reconstruction of data using ImageJ is also covered. This training is also required for second harmonic generation imaging, two photon fluorescence imaging, or coherent anti-stokes Raman imaging.
	Time	Max Attendees	Available	CNS Users ONLY
	10:30 am - 12:00 pm	3	3	Register!

Training - Cleanroom Orientation (Nanofabrication)- Tuesday - LISE-G07, outside the cleanroom door Trainer: Jiangdong Deng Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others.
	Time	Max Attendees	Available	Open Event!
	1:00 pm - 2:30 pm	5	5	Register!

Training - Contact angle measurement - LISE G06 Trainer: Arthur McClelland Learn to use the static contact angle setup to help characterized surface free energy of samples.
	Time	Max Attendees	Available	CNS Users ONLY
	3:30 pm - 4:00 pm	3	3	Register!

Training - CVD-3 STS PECVD Training - LISE CNS Cleanroom G 07 at the tool Trainer: Ling Xie This STS PECVD system is a dual frequency powered parallel electrode reactor. Its top electrode is powered with two generators. One is a standard rf and also called high frequency power supply (HF, 13.56 MHz). Its power control range is 10W to 600W. The second one is a low frequency (LF, 380 kHz) power supply with a power range of 10W to 1000W. The tool has three operation modes, HF, LF, and MF (mixed frequency). Under MF, the top electrode is powered alternately with HF and LF to tailor film stress by varying the HF/LF power-on ratio. The substrate temperature control is from room temperature to 300ºC. Available gases are: SiH4, NH3, N2O, N2, O2, Ar, 1%PH3/Ar, and 1% B2H6/H2. Films that can be deposited using this tool include: SiO2, Si3N4, low-stress Si3N4, amorphous Si, phosphorus and boron doped all above films.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:30 pm - 3:00 pm	4	3	Register!

Training - FESEM training part 2 (prerequisite SEM training part 1) - B15D Trainer: Dave Lange Basic training to use the Ultra and Supra FESEMs
	Time	Max Attendees	Available	CNS Users ONLY
	1:00 pm - 5:00 pm	4	FULL	Registration Closed

Training - Finetech Flip Chip Bonder - LISE G12 Trainer: Guixiong Zhong Basic training for the Finetech Flip chip bonder. Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection. During the bonding process, both chip and substrate are typically heated to an alloying temperature of the interconnect material.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:00 pm	2	1	Register!

Training - Fourier Transform Infrared (FTIR) Spectoscopy - LISE G04 Trainer: Arthur McClelland FTIR is a vibrational spectroscopy technique used primarily for chemical identification. Transmission, variable angle specular reflection, variable polarization, and attenuated total reflectance (ATR-FTIR) techniques are all covered.
	Time	Max Attendees	Available	CNS Users ONLY
	1:00 pm - 2:00 pm Feel free to bring a sample to test	3	3	Register!

Training - LISE G04 orientation and safety training - LISE G04 Trainer: Arthur McClelland Lab orientation and safety training required for access to the LISE G04 optics lab.
	Time	Max Attendees	Available	CNS Users ONLY
	12:00 pm - 12:30 pm	5	5	Register!

Training - LISE/CNS Safety Training - LISE 311 Trainer: Jim Reynolds This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are those who are going to be NNIN/C computational users ONLY or Remote Only Users. This training can be taken prior to turning in your enrollment paperwork.
	Time	Max Attendees	Available	Open Event!
	9:30 am - 12:00 pm For map showing LISE Building see: map.harvard.edu	14	13	Register!

Training - Soft Materials Cleanroom training - LISE G07 Trainer: Monica Zugravu Safety concerns and a brief description of equipment will be discussed. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G07.
	Time	Max Attendees	Available	CNS Users ONLY
	9:30 am - 10:30 am	5	5	Register!

Training - Sputter coater training (HAR-024) - LISE B15A Trainer: Andrew Magyar Training to use the Sputter Coater in B15A (HAR-024). This tool is used to deposit thin layers (10s of nm) of Au, Cr, and Pt-Pd on samples to improve sample conductivity for electron microscopy. Trainees may bring a sample to coat. Please note that B15A Safety Training is needed to use the Sputter Coater (available at 10 AM).
	Time	Max Attendees	Available	CNS Users ONLY
	10:30 am - 11:00 am	4	2	Register!

Training - Thermo Scientific K-Alpha XPS Training - G27 Trainer: Hao-Yu (Greg) Lin Training on the new Thermo XPS system.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 1:00 pm	4	FULL	Registration Closed

Training - WiTec Confocal Raman Microscope Trainining - LISE-G12 Trainer: Jiangdong Deng This training will cover the basic principle and operation procedure of WiTec Confocal Raman Microscope system.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:00 pm	4	4	Register!

Wednesday, May 29th, 2013

Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12 Trainer: Jiangdong Deng In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 3:30 pm	2	2	Register!

Training - Edwards EE-2 e-beam evaporator training - LISE G07 (CNS cleanroom) – PVD Bay Trainer: Ed Macomber Edwards EE-2 e-beam evaporator is capable of depositing many oxides and nitrides such as SiO2, Al2O3, TiO2, MgF2, Si3N4, etc., as well as some common metals, if needed. The operating pressure of the system is E-5 to E-6 torr. Users supply their own crucibles and materials for EE-2. The system deposits directionally so that the sidewalls of features are not coated. This makes the system a preferable choice for processing devices that will undergo a lift-off later in the fabrication chain. The training entails going through an entire operating procedure using a mock test sample.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 3:00 pm (Check confirmation email for document links)	4	4	Register!

Training - Metrology for Nanofabrication Part-1 (Contact Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Trainer: Jason Tresback This metrology training event will focus on fundamental measurement tools for nanofabrication including, contact/surface Profilometer (Veeco DekTek 6m), single wavelength scanning Ellipsometer (Gaertner-LSE), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station). Full access to the tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:00 pm	4	4	Register!

Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Trainer: Jason Tresback This training event covers some advanced metrology techniques, such as Optical Profiler (Wyko NT1100 and CCI HD) (PL-2/6) and Atomic Force Microscopy (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the course, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full access to the Atomic Force Microscope (SPM-5) will require at least one individual user assisted session on a separate day. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	3:00 pm - 5:00 pm	3	3	Register!

Training - RIE-8 STS RIE training - LISE CNS Cleanroom G 07 at the tool Trainer: Ling Xie Introduction The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C. Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden. Chamber Pre-Cleaning Requirement: Please run “O2PlasmaClean” recipe for 20 min. at the beginning to clean the reactor then run minimum 5 - 10 min the recipe you will use for your samples to pre-condition the reactor.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:30 pm - 3:00 pm	4	4	Register!

Training - SP-3 AJA sputtering system training – 3-gun system - CNS cleanroom (G-07) Dry Bay Trainer: Ed Macomber This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to one training for target changes, the user can then change targets to fit their own schedule. After 4 uses (with no problems) users are given 24/7 access.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	3:00 pm - 4:00 pm (check document links in confirmation email)	4	FULL	Registration Closed

Training - SU-8 process training - Meet in the photolithography bay of the main cleanroom G07 Trainer: Hao-Yu (Greg) Lin Training on the use of MJB4 contact aligners, with a focus on SU-8 resist process. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:00 pm	4	4	Register!

Training - Wetbench Use and Safety Training - OUTSIDE the entrance to CNS Cleanroom (G-07). (YES, we meet OUTSIDE in the HALL) Trainer: Mac Hathaway Wetbench Safety Training
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:30 pm	8	8	Register!

Thursday, May 30th, 2013

Training - Atomic Force Microscopy Part-2 Individual User Qualification (MFP3D -AFM) - LISE G12 Trainer: Jason Tresback This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by at least one user assisted session on another day that serves as an individual user qualification, and users are encouraged to bring a sample.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 5:00 pm	3	FULL	Registration Closed

Training - Cleabroom Orientation (Nanofabrication)-Thursday - LISE-G07, outside the cleanroom door Trainer: Jiangdong Deng Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others.
	Time	Max Attendees	Available	Open Event!
	2:30 pm - 4:00 pm	5	5	Register!

Training - CVD-13 - PECVD Diamond - SEKI AX5010 - LISE - G27 Trainer: Philippe de Rouffignac This training covers diamond seeding and diamond deposition on the SEKI AX5010 system. Please email me if you have an urgent need to be trained earlier or are in need for assisted use.
	Time	Max Attendees	Available	CNS Users ONLY
	3:00 pm - 4:30 pm	3	2	Register!

Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06 Trainer: Monica Zugravu Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
	Time	Max Attendees	Available	CNS Users ONLY
	11:30 am - 12:00 pm	5	5	Register!

Training - Introduction to Photolithography/Contact Aligner Training - Meet in the photolithography bay of the cleanroom - please be prompt! Trainer: Steven Hickman Training on the use of the MJB3 and MJB4 contact aligners, with a focus on positive resist processes. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class. If you will primarily be working with SU-8, a recommended alternative is "SU-8 process training".
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 2:30 pm	4	4	Register!

Training - Live Cell Microscope in G05 - LISE G05 Trainer: Arthur McClelland Learn to use the live cell microscope in G05 for time lapse acquisition with phase contrast or fluorescence.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 4:00 pm turn right exiting the elevators and loop around to G05 door	2	1	Register!

Training - MicroCT Training - LISE G27 Trainer: Fettah Kosar Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.0 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at: http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 5:00 pm PREREQUISITE: Complete the "CNS X-Ray Safety Requirements Form" prior to the training and submit it to CNS Admin Office in LISE 306.	3	3	Register!

Training - Photolithography (Headway) Spinner Training - Meet in the photolithography bay of the cleanroom - please be prompt! Trainer: Steven Hickman Training on the use of the Headway resist spinners. Will cover general operation of the spinners, with a focus on preparing positive resist films. Wet bench training is required before taking this class.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	9:00 am - 11:00 am	6	5	Register!

Training - Quantox Non-contact electrical measurement system training - G-27 Trainer: Philippe de Rouffignac This training will provide users with the information necessary to operate the quantox tool effectively and safely. The tool can measure a variety of electrical properties of dielectric films on 6" silicon wafers.
	Time	Max Attendees	Available	CNS Users ONLY
	1:30 pm - 3:00 pm	4	4	Register!

Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay Trainer: Ed Macomber Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	1:00 pm - 3:00 pm (Please review document links in email confirmation)	4	4	Register!

Training - Soft Lithography training - G06 Trainer: Hao-Yu (Greg) Lin Training on all tools at Soft Lithography Foundry located in G06, including UV Flood Exposure System, KLA-Tencor P-16+ Contact Stylus Profiler, Thinky Mixer, Plasma Prep II and Xerox Wax Printer. Please complete the LISE G06 Room Safety Training before this class.
	Time	Max Attendees	Available	CNS Users ONLY
	2:30 pm - 4:30 pm	2	2	Register!

Training - Temperature dependent photoluminescence spectroscopy - LISE G04 Trainer: Arthur McClelland Learn to use the Nd:YAG laser (266nm, 355nm, and 532 nm), the Janis ST-100 cryostat, the McPherson 2035 spectrometer, and the Andor Newton EMCCD camera for photoluminescence spectroscopy.
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 12:30 pm	2	2	Register!

Friday, May 31st, 2013

Training - Disco ADA-321 Automatic Dicing Saw Training Part 2-User Qualification - LISE G06 Trainer: Jason Tresback This training event will allow individual users to operate the dicing saw with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own samples, otherwise a one will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by individual User qualification on another day, AND completion of the LISE G06 Room Safety Training events. Please register for each event.
	Time	Max Attendees	Available	CNS Users ONLY
	2:00 pm - 5:00 pm	3	3	Register!

Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay Trainer: Jiangdong Deng This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
	Time	Max Attendees	Available	LISE Cleanroom Users ONLY
	10:00 am - 12:00 pm	4	4	Register!

Training - UV-VIS Spectrometer - LISE G04 Trainer: Arthur McClelland Learn to use the UV-VIS spectrometer for optical absorption measurements
	Time	Max Attendees	Available	CNS Users ONLY
	10:00 am - 11:00 am	3	2	Register!

New Computational Cluster On-Line

05/16/13
off-campus: Symposium on Materials and Processes for Flexible Devices and Electronics

05/23/13
CNS Lunch Seminar - Tunable Resistive Pulse Sensors for High Resolution Nano/Micro-Particle Analysis

06/25/13 to 08/08/13
Harvard Extension School Course: Engineering Sciences S-157 - Introduction to Fabrication of Microfluidic Devices

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