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CNS User Info
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» Training Sign-up
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Date TBD - you can pre-register for this training session
CNS staff will notify you when a date has been set.
Training - Focused Ion Beam (FIB/SEM) Training Waitlist -
Trainer: Andrew Magyar
A wait list for training on the new FEI FIB/SEM. Please email me, amagyar@cns.fas.harvard.edu and I will add you to the list
  Time Max Attendees Available CNS Users ONLY
  99 86 Pre-Register!  
 
         
 
Thursday, December 18th, 2014
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 FULL Registration Closed  
 
Training - CNS Cleanroom Orientation - Please meet in front of G07
Trainer: John Tsakirgis
To understand our protocols and safety concerns at CNS
  Time Max Attendees Available Open Event!
  10:00 am - 11:30 am
please br prompt and remember to bring your Forms
5 1 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR for analysis of solids, liquids, or powders
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Lindberg furncace CVD-4 - in front of G27
Trainer: John Tsakirgis
To understand the operations and safety of our Lindberg furnace
  Time Max Attendees Available CNS Users ONLY
  9:00 am - 10:00 am
please be prompt
4 3 Register!  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 FULL Registration Closed  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 3:00 pm
(Please review document links in email confirmation)
4 2 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
2 2 Register!  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the Cary 60 UV/VIS spectrometer in transmission and reflection mode.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 3 Register!  
 
         
 
Friday, December 19th, 2014
Training - Advanced training on WiTec NSOM/AFM/Raman system - LISE-G12
Trainer: Jiangdong Deng
This is an advanced training course on the WiTec NSOM/AFM/Raman microscope system. Based on user's request, we will go deeper into this system and explore the capability of near-field optical imaging, AFM, and more. Before take this training, WiTec Raman training is required.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
2 1 Register!  
 
Training - EDS training - B20A
Trainer: Dave Lange
Basic EDS training to use the EDAX EDS systems on the Supra, EVO and Ultra55 SEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 3 Register!  
 
Training - Nanofabrication Cleanroom Optical Microscope and Contact Angle Measurement Training (Visible and IR) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This training event will cover basic operations of the various optical microscopes, digital cameras, and contact angle measurement system available inside the Nanofabrication Cleanroom. There are five independent systems consisting of Nikon L200, Nikon Optiphot 150 and Optiphot 66, and two Olympus BX51s. These are equipped with two Nikon CCD cameras, a Motic camera, an Xfinity 1 CCD camera, and a Q-imaging IR camera. The systems contain 2.5x to 150x objectives, BF/DF modes, reflective/transmission modes, and the Optiphot 150 has a NWL-641 Auto Loader for 4 and 6” wafer cassettes. The FTA135 series contact angle and surface tension measurement system uses video-based software to analyze drop shape without operator error. The manual stage can accommodate up to 200mm wafers and liquid can be dispensed with a fixed volume using syringe pipette.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 3:30 pm
4 4 Register!  
 
         
 
Monday, December 22nd, 2014
Training - Electrical Characterization- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27
Trainer: Jason Tresback
This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Temperature dependent measurements in the range of 100K to 700K can only be made by staff assisted use. Email (jtresback@cns.fas.harvard.edu) if you have any questions, and we meet in the hallway outside LISE G27.
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 3:30 pm
3 2 Register!  
 
Training - Karl Suss MA6 and EVG 620 Mask Aligner Training - photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
Training on the MA6 and EVG 620 mask aligner.Since this training is designed for users with basic knowhow of photolithography and Mask aligners, we’ll jump right in to advantages, advances and operation of the two mask aligners

Prerequisite: Introduction To Photolithography and training on and familiarity with the MJB4 or another MA6 mask aligner
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25 um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 2 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 1 Register!  
 
Training - RIE-7 Unaxis RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 2 Register!  
 
         
 
Tuesday, December 23rd, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 1 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 3 Register!  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 1 Register!  
 
         
 
Wednesday, December 24th, 2014
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 3 Register!  
 
         
 
Monday, December 29th, 2014
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
         
 
Tuesday, December 30th, 2014
Training - CVD - 2 Nexx PECVD System - Dry Processing Bay - LISE Cleanroom
Trainer: Philippe de Rouffignac
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, Ar, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:00 pm
Established SiO2, Si3N4, low-stress Si3N4, and amorphous Si film deposition conditions and results are listed in the Nexx PECVD Logbook.
3 2 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 2:30 pm
4 2 Register!  
 
Training - LPCVD and APCVD Training - Dry-Processing Bay
Trainer: Philippe de Rouffignac
Training for all 6 furnaces of the Tystar System
(SiNx, Poly, TEOS, Oxidation, non-metal anneal, metal anneal) CVD 5,6,7,9,10,11
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:30 am
4 4 Register!  
 
         
 
 

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