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CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Monday, March 2nd, 2015
Training - Karl Suss MA6 and EVG 620 Mask Aligner Training - photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
Training on the MA6 and EVG 620 mask aligner.Since this training is designed for users with basic knowhow of photolithography and Mask aligners, we’ll jump right in to advantages, advances and operation of the two mask aligners

Prerequisite: Introduction To Photolithography and training on and familiarity with the MJB4 or another MA6 mask aligner
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 1 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) -
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
3 3 Register!  
 
Training - Oxygen Plasma Stripper (RIE-5 and RIE-9) - LISE-G07, in the cleanroom Metrology bay
Trainer: Jiangdong Deng
this training will go through the basic operation procedures of two O2 plasma Strippers (RIE-5-Technics Plasma Stripper, RIE-9-Anatech Barrel Plasma system) in the cleanroom. Some typical plasma processes will be covered.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:30 pm - 4:00 pm
jdeng@cns.fas.harvard.edu
4 3 Register!  
 
Training - RIE-7 Unaxis RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 4 Register!  
 
         
 
Tuesday, March 3rd, 2015
Training - EDS training - B20A
Trainer: Dave Lange
Basic training to use the EDAX EDS system on the Supra, Ultra55 or EVO SEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - Heidelberg uPG501 Direct Write Lithography Training - LISE G07 (cleanroom-in front of metrology bay)
Trainer: Guixiong Zhong
Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy. The prerequisite for this training is the photolithography training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
4 3 Register!  
 
Training - KLA Tencor P-16 Contact Stylus Profiler - LISE G06
Trainer: Hao-Yu (Greg) Lin
Training on the KLA Tencor profiler in G06.
System is capable to do 2D and 3D scan with stylus force down to 0.5 mg.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
4 2 Register!  
 
Training - LISE Cleanroom orientation - Meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
Please be prompt ...
5 3 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exception is for Remote Only Users. This training can be taken prior to turning in enrollment paperwork. Please note that you WILL NOT receive a confirmation email, but if you hit the submit button your registration will be received.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 5 Register!  
 
Training - Rapid Thermal Processing - IN the PVD Bay
Trainer: John Tsakirgis
To understand the safety and operation of Rapid thermal processing on the MPTC tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
please be prompt and bring a cleanroom notebook
3 1 Register!  
 
Training - RCA Clean Training - We will meet in the Wet Bay
Trainer: John Tsakirgis
To understand the safety and operation of our RCA Wetbench processes
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
please be prompt
3 3 Register!  
 
Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  12:00 pm - 2:00 pm
(Please review document links in email confirmation)
4 3 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay inside the main clean room
Trainer: Amehayesus Gebreyohannes
This is the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.
Please see the tool webpage for more information on the capabilities of this tool.
Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 2 Register!  
 
Training - Witec confocal Raman Microscope - LISE-G12
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of WITEC confocal Raman Microscope. User is welcome to bring sample for measurement. This training is required for further advance training on Witec system, such as AFM, NSOM, TERS, SEARs et al.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 2 Register!  
 
         
 
Wednesday, March 4th, 2015
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating, Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes.

Prerequisite: Wet bench + chemical Safety training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - Lindbergh Furnace - meet in front of G27
Trainer: John Tsakirgis
To understand the safeties and operations of the Lindbergh Furnace
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt ...
3 3 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
Training - Thermo Scientific XPS Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Learn to use Thermo Scientific K-Alpha XPS system, which equips with a argon sputtering gun and a flood gun.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
4 FULL Registration Closed  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 5 Register!  
 
         
 
Thursday, March 5th, 2015
Training - ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - LISE CNS Cleanroom (G07) Wet Processing Bay
Trainer: Philippe de Rouffignac
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 - 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
5 4 Register!  
 
Training - Asylum Cypher AFM Training Part-1 - LISE G12
Trainer: Jason Tresback
This training will cover basic imaging and operation of the new Asylum Research Cypher AFM demo system. We will highlight the new technology and capabilities of the Cypher AFM system. The tool is quite automated, simple to operate, and configured for samples mounted on 10 or 15mm diameter magnetic discs, which can be moved up to 3mm relative to the probe tip. The quiet, high frequency detector allows ultra-low noise, mini cantilevers that provide routine atomic resolution while scanning up to 20x faster than the MFP3d system.
The most common AC/Tapping mode imaging can be performed with standard piezo driven tip oscillation, however, the Cypher is the only commercial AFM system that can also provide blueDriveTM photo thermal excitation of the cantilever. This is particularly useful while imaging in liquid or at high frequency (>1MHz) where piezo drive and response signals are often unstable and deviate from ideal behavior. The Cypher can also support a variety of advanced imaging modes that use feedback on multiple cantilever resonant frequencies (Eigan Mode's) and provide additional phase contrast. This can be done with Amplitude Modulation (AM), Frequency Modulation (FM), or both to provide more mechanical property and compositional information about the sample. At least one user assisted session, that serves as a qualification for independent use is required to get full access
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
4 FULL Registration Closed  
 
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 3 Register!  
 
Training - Finetech Flip Chip Bonder - G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder in room G12. The Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
Training - LISE Cleanroom orientation - meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  9:00 am - 10:30 am
Please be prompt ...
5 3 Register!  
 
Training - LSD-100 Scriber/Cleaver for III-V materials - G12
Trainer: Guixiong Zhong
Basic training to use the scriber/cleaver. LSD-100 is used for scribing/cleaving III-V compounds.
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 3:30 pm
4 4 Register!  
 
Training - Micro-CT X-ray Imaging Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Training on HMXST Micro-CT X-ray imaging system.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 1:30 pm
4 4 Register!  
 
Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 3:00 pm
(Please review document links in email confirmation)
4 FULL Registration Closed  
 
         
 
Friday, March 6th, 2015
Training - AJA SP-2 sputtering system training - 1pm: LISE 3rd floor (room 311); LISE G07 after that (CNS Cleanroom)
Trainer: Ed Macomber
The SP-2 system is a 6-gun magnetron sputtering machine with (3) RF guns and (3) DC guns to cover a range of metals, semi-conductors, and dielectric materials, including Au, Pt, and magnetics. Sputtering materials are loaded into the system weekly on an "as-requested" basis. Substrate pre-cleaning, heating, co-sputtering, and reactive sputtering are all available on this system. We meet for classroom discussion first, then we go in the cleanroom for training on the actual system.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:30 pm
Check for attachments in the email confirmation
8 6 Register!  
 
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 for basic confocal microscopy
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
3 1 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer training - LISE-G07, in the Metrology bay of cleanroom
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of JA Woollam Spectroscopic Ellipsometer. User is welcome to bring the sample for measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exception is for Remote Only Users. This training can be taken prior to turning in enrollment paperwork. Please note that you WILL NOT receive a confirmation email, but if you hit the submit button your registration will be received.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 6 Register!  
 
Training - Makerbot 3D printer - LISE G06
Trainer: Arthur McClelland
learn to print objects with the Makerbot 3D printer
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
3 1 Register!  
 
Training - SEM training part 1 - LISE 303
Trainer: Dave Lange
Introduction to using the SEMs at CNS. Includes information on the detectors available at CNS.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
15 11 Register!  
 
         
 
Monday, March 9th, 2015
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 2:00 pm
(check links in confirmation email for documents)
4 FULL Registration Closed  
 
Training - Disco ADA-321 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G06
Trainer: Jason Tresback
This training event will cover the basic operation of the Disco ADA-321 Automatic Dicing Saw (SW-1). The tool uses a rotating, ultra-thin (100-300 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, sapphire, ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day, AND completion of the LISE G06 Room Safety Training event. Please register for each event.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 5:00 pm
4 4 Register!  
 
Training - Electrical Characterization- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27
Trainer: Jason Tresback
This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Temperature dependent measurements in the range of 100K to 700K can only be made by staff assisted use. Email (jtresback@cns.fas.harvard.edu) if you have any questions, and we meet in the hallway outside LISE G27.
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 3:30 pm
3 3 Register!  
 
Training - EVG 150 automatic coater/developer training - Photolithography bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In this training session we’ll go over safety precautions, tool description and basic operation/handling of the EVG 150 wafer coater/developer station.

Prerequisite: introduction to Photolithography
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 1 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Ultra and Supra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 1 Register!  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25 um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
3 3 Register!  
 
Training - Oxygen Plasma Stripper (RIE-5 and RIE-9) - LISE-G07, in the cleanroom Metrology bay
Trainer: Jiangdong Deng
this training will go through the basic operation procedures of two O2 plasma Strippers (RIE-5-Technics Plasma Stripper, RIE-9-Anatech Barrel Plasma system) in the cleanroom. Some typical plasma processes will be covered.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:30 pm - 4:00 pm
jdeng@cns.fas.harvard.edu
4 4 Register!  
 
         
 
Tuesday, March 10th, 2015
Training - Asylum Cypher AFM Training Part-1 - LISE G12
Trainer: Jason Tresback
This training will cover basic imaging and operation of the new Asylum Research Cypher AFM demo system. We will highlight the new technology and capabilities of the Cypher AFM system. The tool is quite automated, simple to operate, and configured for samples mounted on 10 or 15mm diameter magnetic discs, which can be moved up to 3mm relative to the probe tip. The quiet, high frequency detector allows ultra-low noise, mini cantilevers that provide routine atomic resolution while scanning up to 20x faster than the MFP3d system.
The most common AC/Tapping mode imaging can be performed with standard piezo driven tip oscillation, however, the Cypher is the only commercial AFM system that can also provide blueDriveTM photo thermal excitation of the cantilever. This is particularly useful while imaging in liquid or at high frequency (>1MHz) where piezo drive and response signals are often unstable and deviate from ideal behavior. The Cypher can also support a variety of advanced imaging modes that use feedback on multiple cantilever resonant frequencies (Eigan Mode's) and provide additional phase contrast. This can be done with Amplitude Modulation (AM), Frequency Modulation (FM), or both to provide more mechanical property and compositional information about the sample. At least one user assisted session, that serves as a qualification for independent use is required to get full access
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
4 4 Register!  
 
Training - Cambridge Nanotech Atomic Layer Deposition Training - Gowning area - G-07 Cleanroom (Meet in GOWNING AREA)
Trainer: Mac Hathaway
Training on the ALD oxide system

For Metals and Nitrides, you will need to use the Gemstar - ALD-2
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 11:30 am
4 2 Register!  
 
Training - CVD - 2 Nexx PECVD System - Dry Processing Bay - LISE Cleanroom
Trainer: Philippe de Rouffignac
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, Ar, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:00 pm
Established SiO2, Si3N4, low-stress Si3N4, and amorphous Si film deposition conditions and results are listed in the Nexx PECVD Logbook.
3 2 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 2:30 pm
4 3 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Ultra and Supra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 4 Register!  
 
Training - HAR-050 Sputter Coater Training - LISE B15A
Trainer: Andrew Magyar
Learn to use the sputter coater in the imaging sample prep room. This tool is primarily used to coat samples with thin (10s of nanometers) films of metals like gold or platinum/palladium to make the samples conductive for SEM.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 10:30 am
B15A Safety training required - offered immediately following the sputter coater training.
4 2 Register!  
 
Training - KLA Tencor P-16 Contact Stylus Profiler - LISE G06
Trainer: Hao-Yu (Greg) Lin
Training on the KLA Tencor profiler in G06.
System is capable to do 2D and 3D scan with stylus force down to 0.5 mg.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
4 4 Register!  
 
Training - LISE B15A Imaging Sample Prep Room Safety Training - LISE B15A
Trainer: Andrew Magyar
This safety training is required to enter the sample prep room. A brief overview of the tools available in B15A will also be provided.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:00 am
8 8 Register!  
 
Training - LISE Cleanroom orientation - Meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
Please be prompt ...
5 4 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exception is for Remote Only Users. This training can be taken prior to turning in enrollment paperwork. Please note that you WILL NOT receive a confirmation email, but if you hit the submit button your registration will be received.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 11 Register!  
 
Training - LPCVD and APCVD Training - Dry-Processing Bay
Trainer: Philippe de Rouffignac
Training for all 6 furnaces of the Tystar System
(SiNx, Poly, TEOS, Oxidation, non-metal anneal, metal anneal) CVD 5,6,7,9,10,11
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:30 am
4 3 Register!  
 
Training - microRaman and microPL Spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam Evolution for microRaman and microPL mapping
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 2 Register!  
 
Training - Rapid Thermal Processing - IN the PVD Bay
Trainer: John Tsakirgis
To understand the safety and operation of Rapid thermal processing on the MPTC tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
please be prompt and bring a cleanroom notebook
3 3 Register!  
 
Training - RCA Clean Training - We will meet in the Wet Bay
Trainer: John Tsakirgis
To understand the safety and operation of our RCA Wetbench processes
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
please be prompt
3 3 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay inside the main clean room
Trainer: Amehayesus Gebreyohannes
This is the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.
Please see the tool webpage for more information on the capabilities of this tool.
Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the UV-VIS spectrometer in transmission and reflection modes from 190-1100nm
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Witec confocal Raman Microscope - LISE-G12
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of WITEC confocal Raman Microscope. User is welcome to bring sample for measurement. This training is required for further advance training on Witec system, such as AFM, NSOM, TERS, SEARs et al.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
         
 
Wednesday, March 11th, 2015
Training - Advance SPM techniques on Asylum AFM - LISE-G12
Trainer: Jiangdong Deng
Based on users' real measurement request, this training course will cover the advanced SPM techniques beyond the AFM basic imaging on Asylum-AFM systems, including MFM, EFM, SPM-lithography, Nano-mechanical measurement, Nano-indentation, various measurement environment, et al. Before taking this training, user is required to pass the basic Asylum training first.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 4:30 pm
2 FULL Registration Closed  
 
Training - AS200 i-line stepper training-Part I - Meet in the photolithography bay of the cleanroom.
Trainer: Guixiong Zhong
This is the first part of a two part stepper training. System overview, job making, editing, reticle loading, automatic wafer loading, wafer stepping, and unloading will be covered in the training. Please see the tool webpage for more information on the capabilities of this tool.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 3 Register!  
 
Training - Contact Angle - LISE G06
Trainer: Arthur McClelland
Learn to use the home built contact angle setup in LISE G06
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 3:30 pm
3 3 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker FTIR microscope in ATR, Transmission, and reflection modes
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 3 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR spectrometer in ATR, transmission, and reflection modes
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating, Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes.

Prerequisite: Wet bench + chemical Safety training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - Lindbergh Furnace - meet in front of G27
Trainer: John Tsakirgis
To understand the safeties and operations of the Lindbergh Furnace
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt ...
3 3 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - SPECTRO XRF Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Learn to use SPECTRO XRF system, which can do elemental analysis on both solid and liquid samples.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 8 Register!  
 
Training - XeF2 Etcher training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Isotropic etching of Si.
  Time Max Attendees Available CNS Users ONLY
  4:00 pm - 4:30 pm
4 3 Register!  
 
         
 
Thursday, March 12th, 2015
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 3 Register!  
 
Training - LISE Cleanroom orientation - meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  9:00 am - 10:30 am
Please be prompt ...
5 5 Register!  
 
Training - Matrix Plasma Asher Operation - clean room
Trainer: David LaFleur
writing recipe and running system
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 2:30 pm
4 4 Register!  
 
Training - RIE-6 Nexx RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - Transparency Photomask Writer Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Training on the in-house PlateRite FX870II transparency photomask writer and layout printing discussion
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 12:00 pm
3 2 Register!  
 
         
 
Friday, March 13th, 2015
Training - AS200 i-line stepper training-Part II - Meet in the photolithography bay of the cleanroom.
Trainer: Guixiong Zhong
This is the second part of a two part stepper training. Manual loading, unloading, aligning, and basic overlay strategy will be covered. The prerequisite is AS200 i-line stepper training-Part I.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 3 Register!  
 
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 for basic confocal microscopy
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
3 3 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer training - LISE-G07, in the Metrology bay of cleanroom
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of JA Woollam Spectroscopic Ellipsometer. User is welcome to bring the sample for measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Makerbot 3D printer - LISE G06
Trainer: Arthur McClelland
learn to print objects with the Makerbot 3D printer
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
3 3 Register!  
 
Training - WiTec advance technique training (NSOM/AFM) - LISE-G12
Trainer: Jiangdong Deng
This training course will cover the advanced techniques of WITEC NSOM/AFM/Raman Microscope system, such as NSOM.AFM,SERS,SEARs. Before taking this training, user are required to finish the WITEC Confocal Raman Training first.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
2 2 Register!  
 
         
 
Monday, March 16th, 2015
Training - Karl Suss MA6 and EVG 620 Mask Aligner Training - photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
Training on the MA6 and EVG 620 mask aligner.Since this training is designed for users with basic knowhow of photolithography and Mask aligners, we’ll jump right in to advantages, advances and operation of the two mask aligners

Prerequisite: Introduction To Photolithography and training on and familiarity with the MJB4 or another MA6 mask aligner
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - Oxygen Plasma Stripper (RIE-5 and RIE-9) - LISE-G07, in the cleanroom Metrology bay
Trainer: Jiangdong Deng
this training will go through the basic operation procedures of two O2 plasma Strippers (RIE-5-Technics Plasma Stripper, RIE-9-Anatech Barrel Plasma system) in the cleanroom. Some typical plasma processes will be covered.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:30 pm - 4:00 pm
jdeng@cns.fas.harvard.edu
4 4 Register!  
 
Training - RIE-7 Unaxis RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 4 Register!  
 
         
 
Tuesday, March 17th, 2015
Training - Heidelberg uPG501 Direct Write Lithography Training - LISE G07 (cleanroom-in front of metrology bay)
Trainer: Guixiong Zhong
Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy. The prerequisite for this training is the photolithography training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
4 3 Register!  
 
Training - JEOL 2010 TEM training - LISE B15G
Trainer: Jules Gardener
This introductory training will cover TEM-mode operation of the 2010 instrument.
*Users should be certified on the JEOL 2100 TEM before taking this training*
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 4:00 pm
3 3 Register!  
 
Training - KLA Tencor P-16 Contact Stylus Profiler - LISE G06
Trainer: Hao-Yu (Greg) Lin
Training on the KLA Tencor profiler in G06.
System is capable to do 2D and 3D scan with stylus force down to 0.5 mg.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
4 4 Register!  
 
Training - LISE Cleanroom orientation - Meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
Please be prompt ...
5 5 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exception is for Remote Only Users. This training can be taken prior to turning in enrollment paperwork. Please note that you WILL NOT receive a confirmation email, but if you hit the submit button your registration will be received.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 15 Register!  
 
Training - microRaman and microPL Spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam Evolution for microRaman and microPL mapping
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 3 Register!  
 
Training - Rapid Thermal Processing - IN the PVD Bay
Trainer: John Tsakirgis
To understand the safety and operation of Rapid thermal processing on the MPTC tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
please be prompt and bring a cleanroom notebook
3 3 Register!  
 
Training - RCA Clean Training - We will meet in the Wet Bay
Trainer: John Tsakirgis
To understand the safety and operation of our RCA Wetbench processes
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
please be prompt
3 3 Register!  
 
Training - RIE-10 SPTS Rapier DRIE - Meet in LISE 319 for the first hour
Trainer: Ling Xie
The SPTS’s Rapier system etches Si using Bosch switched processing for vertical profiles as well as non-switched processing for tapered profiles. The system is equipped with dual plasma sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets; which results in high etch rate, good uniformity, and less tilting around wafer edge. The Electro-Static Clamping Chuck enables good wafer clamping, less wafer bowing compared with mechanical clamping, and wafer-less chamber cleaning. The attached AMS chiller can control the chuck temperature from -20°C to + 40°C and the Claritas end point detector can minimize the micro-trenches of SOI wafer etch as well as control the pre-etch and the post-etch cleaning.

Application

• Si etch solely
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad features: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handle samples ≤ 6”
• Absolutely no-metal mask or metal stop layer
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
4 4 Register!  
 
Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  12:00 pm - 2:00 pm
(Please review document links in email confirmation)
4 3 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay inside the main clean room
Trainer: Amehayesus Gebreyohannes
This is the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.
Please see the tool webpage for more information on the capabilities of this tool.
Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the UV-VIS spectrometer in transmission and reflection modes from 190-1100nm
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Witec confocal Raman Microscope - LISE-G12
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of WITEC confocal Raman Microscope. User is welcome to bring sample for measurement. This training is required for further advance training on Witec system, such as AFM, NSOM, TERS, SEARs et al.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
Wednesday, March 18th, 2015
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - Contact Angle - LISE G06
Trainer: Arthur McClelland
Learn to use the home built contact angle setup in LISE G06
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 3:30 pm
3 3 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker FTIR microscope in ATR, Transmission, and reflection modes
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 3 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR spectrometer in ATR, transmission, and reflection modes
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating, Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes.

Prerequisite: Wet bench + chemical Safety training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - Lindbergh Furnace - meet in front of G27
Trainer: John Tsakirgis
To understand the safeties and operations of the Lindbergh Furnace
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt ...
3 3 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - RIE-8 STS RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.

Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
4 2 Register!  
 
Training - Thermo Scientific XPS Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Learn to use Thermo Scientific K-Alpha XPS system, which equips with a argon sputtering gun and a flood gun.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
4 4 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 8 Register!  
 
         
 
Thursday, March 19th, 2015
Training - ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - LISE CNS Cleanroom (G07) Wet Processing Bay
Trainer: Philippe de Rouffignac
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 - 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
5 5 Register!  
 
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:30 pm
3 2 Register!  
 
Training - CVD-13 PECVD Diamond Seki System - G27
Trainer: Philippe de Rouffignac
Microwave plasma system designed to grow diamond films from an existing diamond surface (nanoparticle or film). This tool can also be used for hydrogen plasma treatment and for carbon nanotube growth (contact tool owner if interested in CNTs; not automatically available to every user)
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 1 Register!  
 
Training - Finetech Flip Chip Bonder - G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder in room G12. The Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
Training - LISE Cleanroom orientation - meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  9:00 am - 10:30 am
Please be prompt ...
5 5 Register!  
 
Training - LSD-100 Scriber/Cleaver for III-V materials - G12
Trainer: Guixiong Zhong
Basic training to use the scriber/cleaver. LSD-100 is used for scribing/cleaving III-V compounds.
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 3:30 pm
4 4 Register!  
 
Training - Micro-CT X-ray Imaging Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Training on HMXST Micro-CT X-ray imaging system.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 1:30 pm
4 4 Register!  
 
Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 3:00 pm
(Please review document links in email confirmation)
4 3 Register!  
 
Training - Wire bonder training - G12
Trainer: Guixiong Zhong
Basic training to use the wire bonder. This wedge bonder is configured for bonding aluminum wire (.001") to gold.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
4 4 Register!  
 
         
 
Friday, March 20th, 2015
Training - JA Woollam Spectroscopic Ellipsometer training - LISE-G07, in the Metrology bay of cleanroom
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of JA Woollam Spectroscopic Ellipsometer. User is welcome to bring the sample for measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
         
 
Monday, March 23rd, 2015
Training - Electrical Characterization- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27
Trainer: Jason Tresback
This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Temperature dependent measurements in the range of 100K to 700K can only be made by staff assisted use. Email (jtresback@cns.fas.harvard.edu) if you have any questions, and we meet in the hallway outside LISE G27.
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 3:30 pm
3 3 Register!  
 
Training - EVG 150 automatic coater/developer training - Photolithography bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In this training session we’ll go over safety precautions, tool description and basic operation/handling of the EVG 150 wafer coater/developer station.

Prerequisite: introduction to Photolithography
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25 um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
3 3 Register!  
 
Training - Oxygen Plasma Stripper (RIE-5 and RIE-9) - LISE-G07, in the cleanroom Metrology bay
Trainer: Jiangdong Deng
this training will go through the basic operation procedures of two O2 plasma Strippers (RIE-5-Technics Plasma Stripper, RIE-9-Anatech Barrel Plasma system) in the cleanroom. Some typical plasma processes will be covered.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:30 pm - 4:00 pm
jdeng@cns.fas.harvard.edu
4 4 Register!  
 
         
 
Tuesday, March 24th, 2015
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Cambridge Nanotech Atomic Layer Deposition Training - Gowning area - G-07 Cleanroom (Meet in GOWNING AREA)
Trainer: Mac Hathaway
Training on the ALD oxide system

For Metals and Nitrides, you will need to use the Gemstar - ALD-2
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 11:30 am
4 4 Register!  
 
Training - CVD - 2 Nexx PECVD System - Dry Processing Bay - LISE Cleanroom
Trainer: Philippe de Rouffignac
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, Ar, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:00 pm
Established SiO2, Si3N4, low-stress Si3N4, and amorphous Si film deposition conditions and results are listed in the Nexx PECVD Logbook.
3 3 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 2:30 pm
4 4 Register!  
 
Training - HAR-050 Sputter Coater Training - LISE B15A
Trainer: Andrew Magyar
Learn to use the sputter coater in the imaging sample prep room. This tool is primarily used to coat samples with thin (10s of nanometers) films of metals like gold or platinum/palladium to make the samples conductive for SEM.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 10:30 am
B15A Safety training required - offered immediately following the sputter coater training.
4 3 Register!  
 
Training - KLA Tencor P-16 Contact Stylus Profiler - LISE G06
Trainer: Hao-Yu (Greg) Lin
Training on the KLA Tencor profiler in G06.
System is capable to do 2D and 3D scan with stylus force down to 0.5 mg.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
4 4 Register!  
 
Training - LISE B15A Imaging Sample Prep Room Safety Training - LISE B15A
Trainer: Andrew Magyar
This safety training is required to enter the sample prep room. A brief overview of the tools available in B15A will also be provided.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:00 am
8 8 Register!  
 
Training - LISE Cleanroom orientation - Meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
Please be prompt ...
5 5 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exception is for Remote Only Users. This training can be taken prior to turning in enrollment paperwork. Please note that you WILL NOT receive a confirmation email, but if you hit the submit button your registration will be received.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 15 Register!  
 
Training - LPCVD and APCVD Training - Dry-Processing Bay
Trainer: Philippe de Rouffignac
Training for all 6 furnaces of the Tystar System
(SiNx, Poly, TEOS, Oxidation, non-metal anneal, metal anneal) CVD 5,6,7,9,10,11
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:30 am
4 4 Register!  
 
Training - microRaman and microPL Spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam Evolution for microRaman and microPL mapping
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 3 Register!  
 
Training - Rapid Thermal Processing - IN the PVD Bay
Trainer: John Tsakirgis
To understand the safety and operation of Rapid thermal processing on the MPTC tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
please be prompt and bring a cleanroom notebook
3 3 Register!  
 
Training - RCA Clean Training - We will meet in the Wet Bay
Trainer: John Tsakirgis
To understand the safety and operation of our RCA Wetbench processes
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
please be prompt
3 3 Register!  
 
Training - RIE-11 PT Diamond RIE - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
1. Introduction
The RIE-11 PT Versaline RIE is an Inductive Coupled Plasma Etching System with a maximum ICP source power of 1,200W and a maximum substrate bias power of 600W. The system is configured to handle 4” wafers and equipped with mechanical clamping and backside helium cooling features. Its substrate temperature can be controlled from 10°C to180°C. In addition, the temperatures of three other components inside the chamber can also be controlled from room temperature to 180°C, including Lid, Ceramic Spool, and Metal Liner. Setting these components at elevated temperatures before processing will reduce by-product coating speed on chamber walls and stabilize chamber conditions for the first couple of runs after the tool was at a stand-by state for a long time.

2. Application
Only Diamond is allowed to be etched in this RIE and all other materials are forbidden.

3. Contacts
For issues related to etching processes, please contact Ling Xie; for issues related to equipment, please contact Steve Paolini and David LaFleur.

Ling Xie: 6-9069 lxie@cns.fas.harvard.edu;
Steve Paolini: 6-9816 spaolini@cns.fas.harvard.edu;
David LaFleur: 5-5024 dlafleur@cns.fas.harvard.edu
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay inside the main clean room
Trainer: Amehayesus Gebreyohannes
This is the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.
Please see the tool webpage for more information on the capabilities of this tool.
Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the UV-VIS spectrometer in transmission and reflection modes from 190-1100nm
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Witec confocal Raman Microscope - LISE-G12
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of WITEC confocal Raman Microscope. User is welcome to bring sample for measurement. This training is required for further advance training on Witec system, such as AFM, NSOM, TERS, SEARs et al.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
Wednesday, March 25th, 2015
Training - Advance SPM techniques on Asylum AFM - LISE-G12
Trainer: Jiangdong Deng
Based on users' real measurement request, this training course will cover the advanced SPM techniques beyond the AFM basic imaging on Asylum-AFM systems, including MFM, EFM, SPM-lithography, Nano-mechanical measurement, Nano-indentation, various measurement environment, et al. Before taking this training, user is required to pass the basic Asylum training first.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 4:30 pm
2 1 Register!  
 
Training - AS200 i-line stepper training-Part I - Meet in the photolithography bay of the cleanroom.
Trainer: Guixiong Zhong
This is the first part of a two part stepper training. System overview, job making, editing, reticle loading, automatic wafer loading, wafer stepping, and unloading will be covered in the training. Please see the tool webpage for more information on the capabilities of this tool.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 4 Register!  
 
Training - Contact Angle - LISE G06
Trainer: Arthur McClelland
Learn to use the home built contact angle setup in LISE G06
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 3:30 pm
3 3 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker FTIR microscope in ATR, Transmission, and reflection modes
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 3 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR spectrometer in ATR, transmission, and reflection modes
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating, Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes.

Prerequisite: Wet bench + chemical Safety training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - Lindbergh Furnace - meet in front of G27
Trainer: John Tsakirgis
To understand the safeties and operations of the Lindbergh Furnace
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt ...
3 3 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - SPECTRO XRF Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Learn to use SPECTRO XRF system, which can do elemental analysis on both solid and liquid samples.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 8 Register!  
 
Training - XeF2 Etcher training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Isotropic etching of Si.
  Time Max Attendees Available CNS Users ONLY
  4:00 pm - 4:30 pm
4 4 Register!  
 
         
 
Thursday, March 26th, 2015
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:30 pm
3 3 Register!  
 
Training - LISE Cleanroom orientation - meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  9:00 am - 10:30 am
Please be prompt ...
5 5 Register!  
 
Training - RIE-1 SouthBay - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Equipment

The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6” sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.

Applications

It can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 4 Register!  
 
Training - RIE-6 Nexx RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 4 Register!  
 
Training - Transparency Photomask Writer Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Training on the in-house PlateRite FX870II transparency photomask writer and layout printing discussion
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 12:00 pm
3 3 Register!  
 
         
 
Friday, March 27th, 2015
Training - AS200 i-line stepper training-Part II - Meet in the photolithography bay of the cleanroom.
Trainer: Guixiong Zhong
This is the second part of a two part stepper training. Manual loading, unloading, aligning, and basic overlay strategy will be covered. The prerequisite is AS200 i-line stepper training-Part I.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 4 Register!  
 
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 for basic confocal microscopy
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
3 3 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer training - LISE-G07, in the Metrology bay of cleanroom
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of JA Woollam Spectroscopic Ellipsometer. User is welcome to bring the sample for measurement.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Makerbot 3D printer - LISE G06
Trainer: Arthur McClelland
learn to print objects with the Makerbot 3D printer
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
3 3 Register!  
 
Training - WiTec advance technique training (NSOM/AFM) - LISE-G12
Trainer: Jiangdong Deng
This training course will cover the advanced techniques of WITEC NSOM/AFM/Raman Microscope system, such as NSOM.AFM,SERS,SEARs. Before taking this training, user are required to finish the WITEC Confocal Raman Training first.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
2 2 Register!  
 
         
 
Monday, March 30th, 2015
Training - Karl Suss MA6 and EVG 620 Mask Aligner Training - photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
Training on the MA6 and EVG 620 mask aligner.Since this training is designed for users with basic knowhow of photolithography and Mask aligners, we’ll jump right in to advantages, advances and operation of the two mask aligners

Prerequisite: Introduction To Photolithography and training on and familiarity with the MJB4 or another MA6 mask aligner
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - Oxygen Plasma Stripper (RIE-5 and RIE-9) - LISE-G07, in the cleanroom Metrology bay
Trainer: Jiangdong Deng
this training will go through the basic operation procedures of two O2 plasma Strippers (RIE-5-Technics Plasma Stripper, RIE-9-Anatech Barrel Plasma system) in the cleanroom. Some typical plasma processes will be covered.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:30 pm - 4:00 pm
jdeng@cns.fas.harvard.edu
4 4 Register!  
 
Training - RIE-7 Unaxis RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 4 Register!  
 
         
 
Tuesday, March 31st, 2015
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Heidelberg uPG501 Direct Write Lithography Training - LISE G07 (cleanroom-in front of metrology bay)
Trainer: Guixiong Zhong
Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy. The prerequisite for this training is the photolithography training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
4 4 Register!  
 
Training - KLA Tencor P-16 Contact Stylus Profiler - LISE G06
Trainer: Hao-Yu (Greg) Lin
Training on the KLA Tencor profiler in G06.
System is capable to do 2D and 3D scan with stylus force down to 0.5 mg.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
4 4 Register!  
 
Training - LISE Cleanroom orientation - Meet in front of G07
Trainer: John Tsakirgis
The orientation of our LISE Clean room, to address our safety, gowning and general protocols.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
Please be prompt ...
5 5 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exception is for Remote Only Users. This training can be taken prior to turning in enrollment paperwork. Please note that you WILL NOT receive a confirmation email, but if you hit the submit button your registration will be received.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 15 Register!  
 
Training - microRaman and microPL Spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam Evolution for microRaman and microPL mapping
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 3 Register!  
 
Training - Rapid Thermal Processing - IN the PVD Bay
Trainer: John Tsakirgis
To understand the safety and operation of Rapid thermal processing on the MPTC tool
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
please be prompt and bring a cleanroom notebook
3 3 Register!  
 
Training - RCA Clean Training - We will meet in the Wet Bay
Trainer: John Tsakirgis
To understand the safety and operation of our RCA Wetbench processes
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
please be prompt
3 3 Register!  
 
Training - RIE-10 SPTS Rapier DRIE - Meet in LISE 319 for the first hour
Trainer: Ling Xie
The SPTS’s Rapier system etches Si using Bosch switched processing for vertical profiles as well as non-switched processing for tapered profiles. The system is equipped with dual plasma sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets; which results in high etch rate, good uniformity, and less tilting around wafer edge. The Electro-Static Clamping Chuck enables good wafer clamping, less wafer bowing compared with mechanical clamping, and wafer-less chamber cleaning. The attached AMS chiller can control the chuck temperature from -20°C to + 40°C and the Claritas end point detector can minimize the micro-trenches of SOI wafer etch as well as control the pre-etch and the post-etch cleaning.

Application

• Si etch solely
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad features: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handle samples ≤ 6”
• Absolutely no-metal mask or metal stop layer
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
4 4 Register!  
 
Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  12:00 pm - 2:00 pm
(Please review document links in email confirmation)
4 4 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay inside the main clean room
Trainer: Amehayesus Gebreyohannes
This is the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.
Please see the tool webpage for more information on the capabilities of this tool.
Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the UV-VIS spectrometer in transmission and reflection modes from 190-1100nm
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - Witec confocal Raman Microscope - LISE-G12
Trainer: Jiangdong Deng
This training course will go through the basic operation procedures of WITEC confocal Raman Microscope. User is welcome to bring sample for measurement. This training is required for further advance training on Witec system, such as AFM, NSOM, TERS, SEARs et al.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
 

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