All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page

(Important information - please read)

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: CNS Safety Training - Zoom
Trainer: Jim Reynolds
This training is required as part of the CNS User enrollment process (step 3 for HU Users, step 7 for non-HU Users). How to sign-up for a CNS Safety Training: The CNS Safety Training is currently held as a virtual event via Zoom on Wednesday mornings from 10:00 to 11:15. To attend an upcoming session, please send an email to: infoATcns.fas.harvard.edu (replace the word AT with the @ symbol) with the subject line: CNS Safety Training and include the date of the session you wish to attend in the body of the email. Please note that the cutoff for that weeks training signup is 2pm on the day before the training. Zoom link for the training will be sent by 5pm the afternoon before the training.

Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs). This includes SEM-8, SEM-12, SEM-13, and SEM-14. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: 2D-Stacker-01 training - G-27
Trainer: Danial Haei
This training covers the the general operation of 2D-Stacker-01. Standard PC stacking process will be covered. Users are expected to bring their own stamp as described in SOP.

Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Any CNS User with a HU Key is eligible to take this training

Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100, JEOL F200 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Any CNS User with a HU Key is eligible to take this training.

Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope, including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.

Training: SEC - Electronic Characterization Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Keithley 4200A and Signatone probe station for electronic device characterization. Capacitor, resistor, transistor, and photovoltaic measurements, among others, are available. Email colella@fas.harvard.edu to schedule.

Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.

Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Raman Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba LabRAM Soleil Raman microscope. Email colella@fas.harvard.edu to schedule.

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery HR 20 Rheometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Tensiometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - UV-Vis/Fluorescence Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba Duetta UV-vis absorbance/fluorescence (photoluminescence) spectrometer. Email colella@fas.harvard.edu to schedule.

Time	Max Attendees	Available	CNS Users ONLY
Tuesday, April 30th, 2024
Training: Disco DAD-3221 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G07
Trainer: Jason Tresback
This training event will cover the basic operation of the Disco DAD-3221 Automatic Dicing Saw (SW-5). The tool uses a rotating, ultra-thin (200 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, and ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from the cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day AND LISE G06 Room Orientation will be covered during part-1
11:00 am - 12:00 pm	3	2	Register!

Training: FIB-4 Helios Basic Training - B15-F
Trainer: Stephan Kraemer
Introduction to basic workflow on the Helios FIB (Cross section analysis including high-resolution imaging in immersion mode).
Time	Max Attendees	Available	CNS Users ONLY
9:00 am - 1:00 pm Prior SEM knowledge recommended but not necessary	4	3	Register!

Training: Introduction to Dry Etching - Online, Zoom ID 990 9681 5765, passcode 315648
Trainer: Ling Xie
In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include: i) What is the plasma used in dry etching processes? ii) Chemical etching, iii) Physical etching, iv) Etch profile control, and v) Dry etch technologies and capabilities in CNS Cleanroom. This introduction class is pre-required for taking trainings on any CNS dry etching systems. At current time, the class is offered online with Zoom: ID 990 9681 5765, passcode 315648.
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 12:00 pm	14	13	Register!

Training: NF-Training Litho. Intro. - Online by Zoom
Trainer: Bok Yeop Ahn
This is an online training Introduction to Lithography at CNS, covering basics of photolithography, e-beam lithography, and 3D laser lithography. Users are encouraged to take this class before taking any other photo- or e-beam lithography trainings. As listed below, there are two prerequisites that you must finish before registering to this training session: - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) Bok is inviting you to a scheduled Zoom meeting. Topic: Introduction to Lithography Time: Apr 30, 2024 10:30 AM Eastern Time (US and Canada) Join Zoom meeting https://harvard.zoom.us/j/92449804037?pwd=eWpJUHZSZVozR0sxVWhIZXp0dVM0QT09 Meeting ID: 924 4980 4037 Password: 623312
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:30 am	20	16	Register!

Training: Office Hours -
Trainer: Mughees Khan
Nanofab process development related discussion hour
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:00 am - 11:00 am	2	2	Register!

Training: RIE 8 STS ICP RIE - CNS Cleanroom
Trainer: Ling Xie
It is required to take the "Introduction to Dry Etching" before this training. The RIE 8 is used to etch silicon, silicon oxide, silicon nitride, silicon carbide, and 2D materials. Chamber Pre-Cleaning and Conditioning are Required: Before etching any samples, users must run the �O2-Clean� recipe for 20 minutes and the recipe to be used for 5-10 minutes. The STS MPX/LPX RIE system is an Inductively Coupled Plasma (ICP) etching system. Using the ICP technology, this RIE is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Available etching gases on this system include SF6, C4F8, O2, H2, Ar, Cl2, BCl3, and HBr. The maximum coil and platen powers are 1200W and 250W, respectively. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15�C to 30�C.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm	4	3	Register!

Training: SEC - Tensiometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements.
Time	Max Attendees	Available	CNS Users ONLY
4:00 pm - 5:00 pm	2	1	Register!

Training: SEM-10, Hitachi SU8230 SEM - G07, Inside Cleanroom
Trainer: Bok Yeop Ahn
This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequisites that you must complete before coming to this SEM-10 training session. - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) - CNS Online SEM Training Module (Online course) https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486 Training location is inside the cleanroom. Let's meet at the tool (SEM-10).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	3	3	Register!

Training: Thermo Scientific XPS Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
One Training Prerequisite
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	4	3	Register!

Training: Zeiss Gemini 560 SEM Training - LISE B15i
Trainer: Tim Cavanaugh
This is a training session on the Zeiss Gemini 560 FESEM for users who have not previously used Zeiss SEM tools at CNS. The Gemini 560 offers the capability for ultra high resolution imaging at low beam energy. This will be an in-depth training session covering all aspects of the hardware and software and the entire imaging process. Please attend this training for access to SEM-13 and/or SEM-14. Users should complete the pre-requisite Part 1 Online training prior to registering for this event.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 1:00 pm	4	1	Register!