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| Training: CNS Safety Training - Zoom | | Trainer: Jim Reynolds | This training is required as part of the CNS User enrollment process (step 3 for HU Users, step 7 for non-HU Users).
How to sign-up for a CNS Safety Training:
The CNS Safety Training is currently held as a virtual event via Zoom on Wednesday mornings from 10:00 to 11:15. To attend an upcoming session, please send an email to: infoATcns.fas.harvard.edu (replace the word AT with the @ symbol) with the subject line: CNS Safety Training and include the date of the session you wish to attend in the body of the email. Please note that the cutoff for that weeks training signup is 2pm on the day before the training. Zoom link for the training will be sent by 5pm the afternoon before the training. | | | | Training: Zeiss SEM Part 1: Online training - Harvard Training Portal | | Trainer: Tim Cavanaugh | The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs). This includes SEM-8, SEM-12, SEM-13, and SEM-14. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
| | | | Training: 2D-Stacker-01 training - G-27 | | Trainer: Danial Haei | | This training covers the the general operation of 2D-Stacker-01. Standard PC stacking process will be covered. Users are expected to bring their own stamp as described in SOP. Please contact danial_haie@fas.harvard.edu to schedule. | | | | Training: HAR-053 sputter coater training (online) - Harvard Training Portal | | Trainer: Jules Gardener | This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.
Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421
Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
Any CNS User with a HU Key is eligible to take this training | | | | Training: Online TEM training course - Harvard Training Portal | | Trainer: Jules Gardener | This is a new online training which is required as the first step of TEM training for the JEOL 2100, JEOL F200 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142
Any CNS User with a HU Key is eligible to take this training. | | | | Training: SEC - AFM Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Bruker JPK NanoWizard 4 XP atomic force microscope, including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - DLS/Zetasizer Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - DMA Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - DSC Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - Electronic Characterization Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Keithley 4200A and Signatone probe station for electronic device characterization. Capacitor, resistor, transistor, and photovoltaic measurements, among others, are available. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - FTIR Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - Nanoindenter Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - NMR Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - Optical Profilometer Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - Raman Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Horiba LabRAM Soleil Raman microscope. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - Rheometer Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the TA Discovery HR 20 Rheometer. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - Tensiometer Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - TGA Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule. | | | | Training: SEC - UV-Vis/Fluorescence Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the Horiba Duetta UV-vis absorbance/fluorescence (photoluminescence) spectrometer. Email colella@fas.harvard.edu to schedule. | | |
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| Training: AB-2 RCA Cleaning Wet Process Station - G07, acid bay in the cleanroom | | Trainer: Bok Yeop Ahn | This training covers the standard operation procedure for the RCA cleaning at the acid wet bench stations. As listed below, there are several prerequisites that you must complete before coming to this training session.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- Wet Bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
Training location is at the acid/base bay inside the cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
| 3 | 3 | Register! | | | | Training: ALD-3 PdR ALD System Training - PVD Bay (last bay in cleanroom); small red and white instrument on the far wall | | Trainer: Mughees Khan | | This training provides users the protocols needed to operate the ALD-3 benchtop thermal ALD system. This system is primarily used for depositing Al2O3, SiO2 and Pt thin films on 4" substrates or 3D objects up to 8mm in height. The tool is capable of 40C deposition of Al2O3 and down to 100C for SiO2 and 125C for Pt. Both the SiO2 and Pt processes utilize Ozone as the counter reactant. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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9:00 am - 10:00 am
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | 2 | Register! | | | | Training: FIB-6 Crossbeam Basic Training - B15-E | | Trainer: Stephan Kraemer | | Introduction to basic workflow on the Zeiss Crossbeam FIB (Cross section analysis, including EDS). | | Time | Max Attendees | Available | CNS Users ONLY |
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9:00 am - 1:00 pm
Prior SEM knowledge recommended but not necessary | 3 | 3 | Register! | | | | Training: Introduction to Thin Film Deposition - Outside Cleanroom, in CNS Training Area | | Trainer: Mac Hathaway | All About Thin Films, with an emphasis on Practical Uses and Important Process Variables
Prerequisite for ALL Thin Film Equipment training | | Time | Max Attendees | Available | CNS Users ONLY |
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10:30 am - 12:00 pm
| 15 | 13 | Register! | | | | Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Cleanroom Dry Processing Bay | | Trainer: Mughees Khan | | Introduction to Thin Film Growth and Processing is required before you can sign up for this training. Users will learn about LPCVD (SiNx, Poly, TEOS) and APCVD (ThOx, Metal Anneal, Non-Metal Anneal) capabilities and associated protocols at CNS. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:00 am - 12:00 pm
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | FULL | Register! | | | | Training: Nikon Micro-CT Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | One Training Prerequisite | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 4 | 3 | Register! | | | | Training: Office Hours - | | Trainer: Ling Xie | To discuss micro- / nano-fabrication related questions using Zoom link
Join Zoom meeting
https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09
Password: 315648
Join by telephone (use any number to dial in)
+1 305 224 1968
+1 309 205 3325
+1 312 626 6799
+1 646 931 3860
+1 929 436 2866
+1 301 715 8592
+1 689 278 1000
+1 719 359 4580
+1 253 205 0468
+1 253 215 8782
+1 346 248 7799
+1 360 209 5623
+1 386 347 5053
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International numbers available: https://harvard.zoom.us/u/abwNsmaaBL
One tap mobile: +13052241968,,99096815765# US
Join by SIP conference room system
Meeting ID: 990 9681 5765
99096815765.315648@zoomcrc.com
| | Time | Max Attendees | Available | CNS Users ONLY |
|---|
3:00 pm - 3:30 pm
Using Zoom link | 1 | 1 | Register! | | | | Training: OL-9 Nanoscribe 3D Lithography System - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This training session covers the standard operation procedure (SOP) for the OL-9 Nanoscribe Lithography System that is useful to fabricate 3D nanostructures in any arbitrary form factors with minimum resolution of 150 nm. As listed below, trainees should complete the prerequisites before getting to this training.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet Bench and Chemical Safety Training Part I and II (Mac Hathaway: hathaway@cns.fas.harvard.edu)
Training location is inside the cleanroom.
Let's meet at the tool. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:00 pm
| 3 | 3 | Register! | | | | Training: RIE 8 STS ICP RIE - CNS Cleanroom | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
The RIE 8 is used to etch silicon, silicon oxide, silicon nitride, silicon carbide, and 2D materials.
Chamber Pre-Cleaning and Conditioning are Required: Before etching any samples, users must run the “O2-Clean” recipe for 20 minutes and the recipe to be used for 5-10 minutes.
The STS MPX/LPX RIE system is an Inductively Coupled Plasma (ICP) etching system. Using the ICP technology, this RIE is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Available etching gases on this system include SF6, C4F8, O2, H2, Ar, Cl2, BCl3, and HBr. The maximum coil and platen powers are 1200W and 250W, respectively. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15°C to 30°C. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:30 pm
| 4 | 2 | Register! | | | | Training: SEM-10, Hitachi SU8230 SEM - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequisites that you must complete before coming to this SEM-10 training session.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- CNS Online SEM Training Module (Online course) https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486
Training location is inside the cleanroom.
Let's meet at the tool (SEM-10). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 3 | 3 | Register! | | |
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| Training: CVD-14 Oxford ICP-CVD - Low Temp - CNS cleanroom - Dry processing bay at CVD-14 | | Trainer: Mughees Khan | | Introduction to Thin Film Growth and Processing is required before you can sign up for training. This training will enable users to grow high quality SiO2, SiNx, and a-Si films. No doping or active cooling is available on this tool. All baseline processes are at 80C with the exception of a-Si, which runs at 200C. Full temperature range is from -20C to 400C. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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11:00 am - 12:30 pm
Prerequisite: Introduction to Thin Film Growth and Processing | 3 | FULL | Register! | | | | Training: CVD-3 STS PECVD - CNS Cleanroom - Dry processing bay | | Trainer: Mughees Khan | This training will provide users the necessary protocol to deposit high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. a-Si films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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9:00 am - 11:00 am
Prerequisite: Introduction to Thin Film Growth and Processing | 3 | 2 | Register! | | | | Training: Cypher S/ES and MFP3d BiO Atomic Force Microscopy (AFM) Training Part-1 (SPM-2 & 6) - LISE B58 | | Trainer: Jason Tresback | | This training event will focus on the basic imaging and operation of the Cypher S/ES and/or MFP3D BiO AFM’s available at CNS (SPM- 2 and 6). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. Please register for each event and meet in hallway outside LISE B58 | | Time | Max Attendees | Available | CNS Users ONLY |
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2:30 pm - 4:00 pm
| 3 | 3 | Register! | | | | Training: Heidelberg Maskless Aligners - LISE G07 Nanofabrication Cleanroom (Metrology Bay) | | Trainer: Guixiong Zhong | This training covers the OL-10, OL-11, and OL-12 maskless aligners. The followings are the prerequisites for the training:
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
- SC-5 Headway Spinner & VPO-1 HMDS Primer Oven (Bok Yeop Ahn: byahn@cns.fas.harvard.edu) | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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12:30 pm - 2:30 pm
| 4 | 1 | Register! | | | | Training: Metrology for Nanofabrication (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (Inside Nanofabrication Cleanroom) | | Trainer: Jason Tresback | | The metrology for nanofabrication training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT (PL-8), multi-wavelength scanning Ellipsometer (ES-3), thin film mapping Reflectometer (MET-35), sheet resistance mapper (MET-39), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above is completed during this training, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:30 pm
| 3 | 1 | Register! | | | | Training: OL-4 SUSS MA6 Mask Aligner - G07, Inside Cleanroom at the tool | | Trainer: Bok Yeop Ahn | This is a training session for MA6 Mask Aligner in the cleanroom at CNS. As listed below, there are several prerequisites that you must finish before getting to MA6 mask aligner training.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
- SC-5 Headway Spinner & VPO-1 HMDS Primer Oven (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
Training location is inside the cleanroom.
Let's meet at the tool (OL-4 Mask aligner). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 3 | FULL | Register! | | | | Training: Optical Profiler Training (PL-6) - Inside Nanofabrication Cleanroom (LISE G07) | | Trainer: Jason Tresback | | This training event basic operation of the Optical Profiler (CCI HD) (PL-6) which uses white light interferometry (WLI) to measure roughness, step-heights, and topography with sub-nm vertical resolution and 1um lateral resolution. This is a rapid, non-contact, and non-destructive technique to analyze small areas (80x80 um) and large areas (100x100 mm). Limitations include thin, transparent films and dissimilar materials. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 2:30 pm
| 3 | 2 | Register! | | | | Training: RIE 11 Plasma-Therm Diamond Etcher - CNS Cleanroom at the tool | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
RIE 11 is used for diamond etch only!
The Versaline RIE is an Inductive Coupled Plasma Etching System with a maximum ICP source power of 1,200W and a maximum substrate bias power of 600W. The system is configured to handle 4” wafers and equipped with mechanical clamping and backside helium heat-conducting features. Its substrate temperature can be controlled from 10°C to180°C. In addition, temperatures of three other components inside the chamber can also be controlled from room temperature to 120°C, including Lid, Ceramic Spool, and Metal Liner. Setting these components at elevated temperatures before processing will reduce by-product coating speed on chamber walls and stabilize chamber conditions for the first couple of runs after the tool was at a stand-by state for a long time. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
| 4 | 4 | Register! | | | | Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | | RIE-13 - Oxford PlasmaPro 100 Cobra 300 | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
617-495-1738 | 4 | FULL | Register! | | | | Training: SC-5 Headway Spinner & VPO-1 HMDS Primer Oven - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This training session covers the standard operation procedure (SOP) for spin coaters in the cleanroom at CNS. As listed below, there are several prerequisites. Please complete the prerequisite trainings before coming to the spin coater training.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
Note, the training location is inside the cleanroom.
Let's meet at the first wet-bench you see in the cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
| 3 | 2 | Register! | | | | Training: SEC - DSC Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the TA Discover DSC 250 differential scanning calorimeter. | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 5:00 pm
| 2 | 1 | Register! | | | | Training: WB-2 EVG 501 Wafer Bonder - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This training covers the standard operation procedure for the WB-2 EVG 501 Wafer Bonder. Users will learn wafer bonding techniques:
1) Direct
2) Thermo-Compression
3) Adhesive
** Users may need Wet Bench/Acid/RCA Training
Training location is inside the cleanroom.
Let's meet at the tool. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Wetbench and Chemical Safety Training - Outside Cleanroom, in CNS Training Area | | Trainer: Mac Hathaway | | Chemical Safety and Wetbench Operations, with an emphasis on Situational Awareness, and how to Live a Good Life. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 12:30 pm
| 10 | 7 | Register! | | | | Training: Zeiss Gemini 360 SEM Training - LISE B15i | | Trainer: Tim Cavanaugh | | This is a training session on the Zeiss Gemini 360 FESEM for users who have not previously used Zeiss SEM tools at CNS. The Gemini 360 offers high resolution secondary and backscatter imaging at high vacuum, as well as low vacuum capability. This will be an in depth training session covering all aspects of the hardware and software and the entire imaging process. Please attend this training for access to SEM-13 and/or SEM-14. Users should complete the pre-requisite Part 1 Online training prior to registering for this event. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 1:00 pm
| 4 | 1 | Register! | | |
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| Training: ALD-2 GEMStar ALD Training - Wet Processing Bay - CNS cleanroom | | Trainer: Mughees Khan | | This training introduces users protocols needed to operate ALD-2. This system is primarily used for depositing conducting metal nitride and potentially pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 � per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable. Currently, only WNx is available. In addition, Al2O3 can also be deposited on this tool. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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9:00 am - 10:00 am
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | 2 | Register! | | | | Training: B15A In Person Sample Prep Training - LISE B15A - grey couches in LISE basement | | Trainer: Cathleen Hallinan | | The B15A Sample Prep lab training will cover basic safety measures within the B15A space as well as protocols, policies and relevant resources of the space. Trainings will be conducted by the lab safety officer, Cathleen Hallinan. If you have any questions or concerns please reach out to Cathleen via email at cathleen_hallinan@fas.harvard.edu | | Time | Max Attendees | Available | CNS Users ONLY |
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11:30 am - 12:30 pm
| 10 | 10 | Register! | | | | Training: CNS cleanroom orientation - Meet in front od G07. | | Trainer: John Tsakirgis | | To understand the safety and operational protocols for our cleanroom. | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:00 am
Please be prompt | 10 | 7 | Register! | | | | Training: SEC - Rheometer Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training on the TA Discovery HR 20 Rheometer. | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 5:00 pm
| 2 | 1 | Register! | | |
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| Training: Disco DAD-3221 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G07 | | Trainer: Jason Tresback | | This training event will cover the basic operation of the Disco DAD-3221 Automatic Dicing Saw (SW-5). The tool uses a rotating, ultra-thin (200 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, and ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from the cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day AND LISE G06 Room Orientation will be covered during part-1 | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 12:00 pm
| 3 | FULL | Register! | | | | Training: FIB-4 Helios Basic Training - B15-F | | Trainer: Stephan Kraemer | | Introduction to basic workflow on the Helios FIB (Cross section analysis including high-resolution imaging in immersion mode). | | Time | Max Attendees | Available | CNS Users ONLY |
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9:00 am - 1:00 pm
Prior SEM knowledge recommended but not necessary | 4 | 4 | Register! | | | | Training: Introduction to Dry Etching - Online, Zoom ID 990 9681 5765, passcode 315648 | | Trainer: Ling Xie | In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include:
i) What is the plasma used in dry etching processes?
ii) Chemical etching,
iii) Physical etching,
iv) Etch profile control, and
v) Dry etch technologies and capabilities in CNS Cleanroom.
This introduction class is pre-required for taking trainings on any CNS dry etching systems.
At current time, the class is offered online with Zoom: ID 990 9681 5765, passcode 315648.
| | Time | Max Attendees | Available | CNS Users ONLY |
|---|
11:00 am - 12:00 pm
| 14 | 10 | Register! | | | | Training: NF-Training Litho. Intro. - Online by Zoom | | Trainer: Bok Yeop Ahn | This is an online training Introduction to Lithography at CNS, covering basics of photolithography, e-beam lithography, and 3D laser lithography. Users are encouraged to take this class before taking any other photo- or e-beam lithography trainings. As listed below, there are two prerequisites that you must finish before registering to this training session:
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
Bok is inviting you to a scheduled Zoom meeting.
Topic: Introduction to Lithography
Time: May 14, 2024 10:30 AM Eastern Time (US and Canada)
Join Zoom meeting
https://harvard.zoom.us/j/93017789831?pwd=Z0RTMUFWb1VhYnloR1NyRk9LYXFPdz09
Meeting ID: 930 1778 9831
Password: 351359
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 11:30 am
| 20 | 18 | Register! | | | | Training: Office Hours - | | Trainer: Mughees Khan | | Nanofab process development related discussion hour. Meeting can be in-person or remote (zoom link will be sent out closer to the meeting if remote). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
10:00 am - 11:00 am
| 2 | 2 | Register! | | | | Training: Office Hours - | | Trainer: Ling Xie | To discuss micro- / nano-fabrication related questions using Zoom link
Join Zoom meeting
https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09
Password: 315648
Join by telephone (use any number to dial in)
+1 305 224 1968
+1 309 205 3325
+1 312 626 6799
+1 646 931 3860
+1 929 436 2866
+1 301 715 8592
+1 689 278 1000
+1 719 359 4580
+1 253 205 0468
+1 253 215 8782
+1 346 248 7799
+1 360 209 5623
+1 386 347 5053
+1 507 473 4847
+1 564 217 2000
+1 669 444 9171
+1 669 900 6833
International numbers available: https://harvard.zoom.us/u/abwNsmaaBL
One tap mobile: +13052241968,,99096815765# US
Join by SIP conference room system
Meeting ID: 990 9681 5765
99096815765.315648@zoomcrc.com
| | Time | Max Attendees | Available | CNS Users ONLY |
|---|
3:00 pm - 3:30 pm
Using Zoom link | 1 | 1 | Register! | | | | Training: SEM-10, Hitachi SU8230 SEM - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequisites that you must complete before coming to this SEM-10 training session.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- CNS Online SEM Training Module (Online course) https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486
Training location is inside the cleanroom.
Let's meet at the tool (SEM-10). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
2:00 pm - 3:00 pm
| 3 | 2 | Register! | | | | Training: Thermo Scientific XPS Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | One Training Prerequisite | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 4 | 2 | Register! | | | | Training: Woollam RC2 Spectroscopic Ellipsometer Training (ES-4) - Inside LISE G07 Nanofabrication CLeanroom | | Trainer: Jason Tresback | | This training event will cover the basic operation of RC2 spectroscopic ellipsometer including sample mounting, auto-alignment, model selection/development, and mapping using small spot size (125um) with wavelength range of 200-2500nm. Wafer mapping will also be covered. We will meet inside the Nanofabrication cleanroom along the windows | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
2:00 pm - 3:00 pm
| 3 | 3 | Register! | | | | Training: XeF2 Etcher Training - CNS Cleanroom G07 | | Trainer: Ling Xie | | Etch Si with a high selectivity to SiO2, Si3N4, Resist. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:30 pm - 2:30 pm
| 4 | 2 | Register! | | |
|
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| Training: CNS cleanroom orientation - Meet in front od G07. | | Trainer: John Tsakirgis | | To understand the safety and operational protocols for our cleanroom. | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
9:30 am - 11:00 am
Please be prompt | 10 | 10 | Register! | | | | Training: EL-6 and EL7 training - EL-7 room | | Trainer: Yuan Lu | | EL-6 and EL7 training | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
11:00 am - 2:00 pm
| 6 | 6 | Register! | | | | Training: Jupiter XR Atomic Force Microscopy (AFM) Training Part-1 (SPM-12) Inside the Cleanroom - Inside LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | This training event will focus on the basic imaging and operation of the Jupiter XR AFM available inside the Nanofabrication Cleanroom (SPM-12). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
2:30 pm - 4:00 pm
| 3 | 2 | Register! | | | | Training: Metrology for Nanofabrication (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (Inside Nanofabrication Cleanroom) | | Trainer: Jason Tresback | | The metrology for nanofabrication training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT (PL-8), multi-wavelength scanning Ellipsometer (ES-3), thin film mapping Reflectometer (MET-35), sheet resistance mapper (MET-39), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above is completed during this training, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
10:30 am - 12:30 pm
| 3 | 1 | Register! | | | | Training: RIE 10 Rapier DRIE Training - The first hour training is online, Zoom ID 990 9681 5765, passcode 315648, held outside the cleanroom and the rest of time is inside the cleanroom. | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
The SPTS Rapier system is for deep silicon etch only, it is configured with dual plasma sources, dual gas inlets, electro-static clamping chuck, AMS chiller to control the chuck temperature from -15°C to + 40°C, and Claritas end-point detector.
Specifications
• Etch rate: 1.0 – 10 µm/min
• Aspect ratio: 5 – 50
• Etch depth: 5µm – several hundreds of microns
• Feature size: nm – mm scales in lateral dimension
• Sider wall roughness (scallop depth): 6nm – 700nm
• Sample size ≤ 6”
• Etch mask: only resists and SiO2 allowed
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 3:30 pm
| 4 | 1 | Register! | | |
|
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| Training: B15A In Person Sample Prep Training - LISE B15A - grey couches in LISE basement | | Trainer: Cathleen Hallinan | | The B15A Sample Prep lab training will cover basic safety measures within the B15A space as well as protocols, policies and relevant resources of the space. Trainings will be conducted by the lab safety officer, Cathleen Hallinan. If you have any questions or concerns please reach out to Cathleen via email at cathleen_hallinan@fas.harvard.edu | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
11:30 am - 12:30 pm
| 10 | 10 | Register! | | | | Training: Denton E-beam Evaporator (EE-4) training - | | Trainer: Ed Macomber | Please read the training description all the way through.
For depositions thicker than 0.5 micron, contact CNS staff.
In this training, the use of the Denton EE-4 e-beam system for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:00 pm - 2:00 pm
(check links in confirmation email for documents) | 4 | FULL | Register! | | | | Training: DOE-1 - ULVAC Deep Oxide Etcher - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | DOE-1 - ULVAC Deep Oxide Etcher
| | Time | Max Attendees | Available | CNS Users ONLY |
|---|
3:30 pm - 4:30 pm
617-495-1738 | 4 | 4 | Register! | | | | Training: RIE-9 - Anatech Barrel Plasma System and RIE-14 - Samco PC-300 Plasma Cleaning System - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | RIE-9 - Anatech Barrel Plasma System
RIE-14 - Samco PC-300 Plasma Cleaning System
Training section included both tools. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
4:30 pm - 5:00 pm
617-495-1738 | 5 | 4 | Register! | | |
|
|
| Training: AB-2 RCA Cleaning Wet Process Station - G07, acid bay in the cleanroom | | Trainer: Bok Yeop Ahn | This training covers the standard operation procedure for the RCA cleaning at the acid wet bench stations. As listed below, there are several prerequisites that you must complete before coming to this training session.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- Wet Bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
Training location is at the acid/base bay inside the cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:00 pm - 2:00 pm
| 3 | 1 | Register! | | | | Training: ALD-3 PdR ALD System Training - PVD Bay (last bay in cleanroom); small red and white instrument on the far wall | | Trainer: Mughees Khan | | This training provides users the protocols needed to operate the ALD-3 benchtop thermal ALD system. This system is primarily used for depositing Al2O3, SiO2 and Pt thin films on 4" substrates or 3D objects up to 8mm in height. The tool is capable of 40C deposition of Al2O3 and down to 100C for SiO2 and 125C for Pt. Both the SiO2 and Pt processes utilize Ozone as the counter reactant. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
9:00 am - 10:00 am
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | 1 | Register! | | | | Training: FIB-6 Crossbeam Basic Training - B15-E | | Trainer: Stephan Kraemer | | Introduction to basic workflow on the Zeiss Crossbeam FIB (Cross section analysis, including EDS). | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
9:00 am - 1:00 pm
Prior SEM knowledge recommended but not necessary | 3 | 3 | Register! | | | | Training: Introduction to Thin Film Deposition - Outside Cleanroom, in CNS Training Area | | Trainer: Mac Hathaway | All About Thin Films, with an emphasis on Practical Uses and Important Process Variables
Prerequisite for ALL Thin Film Equipment training | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
10:30 am - 12:00 pm
| 15 | 13 | Register! | | | | Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Cleanroom Dry Processing Bay | | Trainer: Mughees Khan | | Introduction to Thin Film Growth and Processing is required before you can sign up for this training. Users will learn about LPCVD (SiNx, Poly, TEOS) and APCVD (ThOx, Metal Anneal, Non-Metal Anneal) capabilities and associated protocols at CNS. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
10:00 am - 12:00 pm
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | FULL | Register! | | | | Training: Nikon Micro-CT Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | One Training Prerequisite | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
9:30 am - 11:30 am
| 4 | 4 | Register! | | | | Training: Office Hours - | | Trainer: Ling Xie | To discuss micro- / nano-fabrication related questions using Zoom link
Join Zoom meeting
https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09
Password: 315648
Join by telephone (use any number to dial in)
+1 305 224 1968
+1 309 205 3325
+1 312 626 6799
+1 646 931 3860
+1 929 436 2866
+1 301 715 8592
+1 689 278 1000
+1 719 359 4580
+1 253 205 0468
+1 253 215 8782
+1 346 248 7799
+1 360 209 5623
+1 386 347 5053
+1 507 473 4847
+1 564 217 2000
+1 669 444 9171
+1 669 900 6833
International numbers available: https://harvard.zoom.us/u/abwNsmaaBL
One tap mobile: +13052241968,,99096815765# US
Join by SIP conference room system
Meeting ID: 990 9681 5765
99096815765.315648@zoomcrc.com
| | Time | Max Attendees | Available | CNS Users ONLY |
|---|
3:00 pm - 3:30 pm
Using Zoom link | 1 | 1 | Register! | | | | Training: OL-9 Nanoscribe 3D Lithography System - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This training session covers the standard operation procedure (SOP) for the OL-9 Nanoscribe Lithography System that is useful to fabricate 3D nanostructures in any arbitrary form factors with minimum resolution of 150 nm. As listed below, trainees should complete the prerequisites before getting to this training.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet Bench and Chemical Safety Training Part I and II (Mac Hathaway: hathaway@cns.fas.harvard.edu)
Training location is inside the cleanroom.
Let's meet at the tool. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
10:30 am - 12:00 pm
| 3 | 3 | Register! | | | | Training: RIE 8 STS ICP RIE - CNS Cleanroom | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
The RIE 8 is used to etch silicon, silicon oxide, silicon nitride, silicon carbide, and 2D materials.
Chamber Pre-Cleaning and Conditioning are Required: Before etching any samples, users must run the “O2-Clean” recipe for 20 minutes and the recipe to be used for 5-10 minutes.
The STS MPX/LPX RIE system is an Inductively Coupled Plasma (ICP) etching system. Using the ICP technology, this RIE is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Available etching gases on this system include SF6, C4F8, O2, H2, Ar, Cl2, BCl3, and HBr. The maximum coil and platen powers are 1200W and 250W, respectively. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15°C to 30°C. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:00 pm - 2:30 pm
| 4 | 2 | Register! | | | | Training: SEM-10, Hitachi SU8230 SEM - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequisites that you must complete before coming to this SEM-10 training session.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- CNS Online SEM Training Module (Online course) https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486
Training location is inside the cleanroom.
Let's meet at the tool (SEM-10). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
2:00 pm - 3:00 pm
| 3 | 1 | Register! | | |
|
|
| Training: CVD-14 Oxford ICP-CVD - Low Temp - CNS cleanroom - Dry processing bay at CVD-14 | | Trainer: Mughees Khan | | Introduction to Thin Film Growth and Processing is required before you can sign up for training. This training will enable users to grow high quality SiO2, SiNx, and a-Si films. No doping or active cooling is available on this tool. All baseline processes are at 80C with the exception of a-Si, which runs at 200C. Full temperature range is from -20C to 400C. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
11:00 am - 12:30 pm
Prerequisite: Introduction to Thin Film Growth and Processing | 3 | 1 | Register! | | | | Training: CVD-3 STS PECVD - CNS Cleanroom - Dry processing bay | | Trainer: Mughees Khan | This training will provide users the necessary protocol to deposit high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. a-Si films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
9:00 am - 11:00 am
Prerequisite: Introduction to Thin Film Growth and Processing | 3 | 2 | Register! | | | | Training: Cypher S/ES and MFP3d BiO Atomic Force Microscopy (AFM) Training Part-1 (SPM-2 & 6) - LISE B58 | | Trainer: Jason Tresback | | This training event will focus on the basic imaging and operation of the Cypher S/ES and/or MFP3D BiO AFM’s available at CNS (SPM- 2 and 6). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. Please register for each event and meet in hallway outside LISE B58 | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
2:30 pm - 4:00 pm
| 3 | 2 | Register! | | | | Training: Heidelberg Maskless Aligners - LISE G07 Nanofabrication Cleanroom (Metrology Bay) | | Trainer: Guixiong Zhong | This training covers the OL-10, OL-11, and OL-12 maskless aligners. The followings are the prerequisites for the training:
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
- SC-5 Headway Spinner & VPO-1 HMDS Primer Oven (Bok Yeop Ahn: byahn@cns.fas.harvard.edu) | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
12:30 pm - 2:30 pm
| 4 | 4 | Register! | | | | Training: Metrology for Nanofabrication (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (Inside Nanofabrication Cleanroom) | | Trainer: Jason Tresback | | The metrology for nanofabrication training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT (PL-8), multi-wavelength scanning Ellipsometer (ES-3), thin film mapping Reflectometer (MET-35), sheet resistance mapper (MET-39), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above is completed during this training, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
10:30 am - 12:30 pm
| 3 | 3 | Register! | | | | Training: OL-4 SUSS MA6 Mask Aligner - G07, Inside Cleanroom at the tool | | Trainer: Bok Yeop Ahn | This is a training session for MA6 Mask Aligner in the cleanroom at CNS. As listed below, there are several prerequisites that you must finish before getting to MA6 mask aligner training.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
- SC-5 Headway Spinner & VPO-1 HMDS Primer Oven (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
Training location is inside the cleanroom.
Let's meet at the tool (OL-4 Mask aligner). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
2:00 pm - 3:00 pm
| 3 | 1 | Register! | | | | Training: Optical Profiler Training (PL-6) - Inside Nanofabrication Cleanroom (LISE G07) | | Trainer: Jason Tresback | | This training event basic operation of the Optical Profiler (CCI HD) (PL-6) which uses white light interferometry (WLI) to measure roughness, step-heights, and topography with sub-nm vertical resolution and 1um lateral resolution. This is a rapid, non-contact, and non-destructive technique to analyze small areas (80x80 um) and large areas (100x100 mm). Limitations include thin, transparent films and dissimilar materials. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:30 pm - 2:30 pm
| 3 | 2 | Register! | | | | Training: RIE 11 Plasma-Therm Diamond Etcher - CNS Cleanroom at the tool | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
RIE 11 is used for diamond etch only!
The Versaline RIE is an Inductive Coupled Plasma Etching System with a maximum ICP source power of 1,200W and a maximum substrate bias power of 600W. The system is configured to handle 4” wafers and equipped with mechanical clamping and backside helium heat-conducting features. Its substrate temperature can be controlled from 10°C to180°C. In addition, temperatures of three other components inside the chamber can also be controlled from room temperature to 120°C, including Lid, Ceramic Spool, and Metal Liner. Setting these components at elevated temperatures before processing will reduce by-product coating speed on chamber walls and stabilize chamber conditions for the first couple of runs after the tool was at a stand-by state for a long time. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:00 pm - 2:00 pm
| 4 | 4 | Register! | | | | Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | | RIE-13 - Oxford PlasmaPro 100 Cobra 300 | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
3:00 pm - 4:00 pm
617-495-1738 | 4 | 2 | Register! | | | | Training: SC-5 Headway Spinner & VPO-1 HMDS Primer Oven - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This training session covers the standard operation procedure (SOP) for spin coaters in the cleanroom at CNS. As listed below, there are several prerequisites. Please complete the prerequisite trainings before coming to the spin coater training.
- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
Note, the training location is inside the cleanroom.
Let's meet at the first wet-bench you see in the cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
1:00 pm - 2:00 pm
| 3 | 1 | Register! | | | | Training: WB-2 EVG 501 Wafer Bonder - G07, Inside Cleanroom | | Trainer: Bok Yeop Ahn | This training covers the standard operation procedure for the WB-2 EVG 501 Wafer Bonder. Users will learn wafer bonding techniques:
1) Direct
2) Thermo-Compression
3) Adhesive
** Users may need Wet Bench/Acid/RCA Training
Training location is inside the cleanroom.
Let's meet at the tool. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
10:30 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Wetbench and Chemical Safety Training - Outside Cleanroom, in CNS Training Area | | Trainer: Mac Hathaway | | Chemical Safety and Wetbench Operations, with an emphasis on Situational Awareness, and how to Live a Good Life. | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
10:00 am - 12:30 pm
| 10 | 9 | Register! | | |
|
|
| Training: ALD-2 GEMStar ALD Training - Wet Processing Bay - CNS cleanroom | | Trainer: Mughees Khan | | This training introduces users protocols needed to operate ALD-2. This system is primarily used for depositing conducting metal nitride and potentially pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 � per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable. Currently, only WNx is available. In addition, Al2O3 can also be deposited on this tool. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
|---|
9:00 am - 10:00 am
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | 2 | Register! | | | | Training: B15A In Person Sample Prep Training - LISE B15A - grey couches in LISE basement | | Trainer: Cathleen Hallinan | | The B15A Sample Prep lab training will cover basic safety measures within the B15A space as well as protocols, policies and relevant resources of the space. Trainings will be conducted by the lab safety officer, Cathleen Hallinan. If you have any questions or concerns please reach out to Cathleen via email at cathleen_hallinan@fas.harvard.edu | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
11:30 am - 12:30 pm
| 10 | 10 | Register! | | | | Training: CNS Cleanroom orientation - meet in front of G07 | | Trainer: John Tsakirgis | | To get familiar with CNS protocols and safety | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
9:30 am - 11:00 am
please be prompt | 10 | 10 | Register! | | | | Training: Wedge and Ball Bonder - LISE G27 | | Trainer: Guixiong Zhong | | Basic training to use the TPT HB16 Wedge and Ball Bonder. | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
12:30 pm - 2:00 pm
| 3 | 2 | Register! | | |
|
|
| Training: Disco DAD-3221 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G07 | | Trainer: Jason Tresback | | This training event will cover the basic operation of the Disco DAD-3221 Automatic Dicing Saw (SW-5). The tool uses a rotating, ultra-thin (200 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, and ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from the cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day AND LISE G06 Room Orientation will be covered during part-1 | | Time | Max Attendees | Available | CNS Users ONLY |
|---|
11:00 am - 12:00 pm
| 3 | 2 | Register! | | | | Training: FIB-4 Helios Basic Training - B15-F | | Trainer: Stephan Kraemer | | Introduction to basic workflow on the Helios FIB (Cross section analysis including high-resolution imaging in immersion mode). | | Time | Max Attendees | Available | CNS Users ONLY |
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9:00 am - 1:00 pm
Prior SEM knowledge recommended but not necessary | 4 | 4 | Register! | | | | Training: Introduction to Dry Etching - Online, Zoom ID 990 9681 5765, passcode 315648 | | Trainer: Ling Xie | In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include:
i) What is the plasma used in dry etching processes?
ii) Chemical etching,
iii) Physical etching,
iv) Etch profile control, and
v) Dry etch technologies and capabilities in CNS Cleanroom.
This introduction class is pre-required for taking trainings on any CNS dry etching systems.
At current time, the class is offered online with Zoom: ID 990 9681 5765, passcode 315648.
| | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 12:00 pm
| 14 | 14 | Register! | | | | Training: Office Hours - | | Trainer: Mughees Khan | | Nanofab process development related discussion hour. Meeting can be in-person or remote (zoom link will be sent out closer to the meeting if remote). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:00 am - 11:00 am
| 2 | 2 | Register! | | | | Training: Office Hours - | | Trainer: Ling Xie | To discuss micro- / nano-fabrication related questions using Zoom link
Join Zoom meeting
https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09
Password: 315648
Join by telephone (use any number to dial in)
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Join by SIP conference room system
Meeting ID: 990 9681 5765
99096815765.315648@zoomcrc.com
| | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 3:30 pm
Using Zoom link | 1 | 1 | Register! | | | | Training: Thermo Scientific XPS Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | One Training Prerequisite | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 4 | 4 | Register! | | | | Training: Woollam RC2 Spectroscopic Ellipsometer Training (ES-4) - Inside LISE G07 Nanofabrication CLeanroom | | Trainer: Jason Tresback | | This training event will cover the basic operation of RC2 spectroscopic ellipsometer including sample mounting, auto-alignment, model selection/development, and mapping using small spot size (125um) with wavelength range of 200-2500nm. Wafer mapping will also be covered. We will meet inside the Nanofabrication cleanroom along the windows | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 3 | 3 | Register! | | | | Training: XeF2 Etcher Training - CNS Cleanroom G07 | | Trainer: Ling Xie | | Etch Si with a high selectivity to SiO2, Si3N4, Resist. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 2:30 pm
| 4 | 4 | Register! | | |
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| Training: EL-6 and EL7 training - EL-7 room | | Trainer: Yuan Lu | | EL-6 and EL7 training | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 2:00 pm
| 6 | 6 | Register! | | | | Training: Jupiter XR Atomic Force Microscopy (AFM) Training Part-1 (SPM-12) Inside the Cleanroom - Inside LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | This training event will focus on the basic imaging and operation of the Jupiter XR AFM available inside the Nanofabrication Cleanroom (SPM-12). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 4:00 pm
| 3 | 3 | Register! | | | | Training: Metrology for Nanofabrication (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (Inside Nanofabrication Cleanroom) | | Trainer: Jason Tresback | | The metrology for nanofabrication training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT (PL-8), multi-wavelength scanning Ellipsometer (ES-3), thin film mapping Reflectometer (MET-35), sheet resistance mapper (MET-39), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above is completed during this training, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:30 pm
| 3 | 3 | Register! | | | | Training: RIE 10 Rapier DRIE Training - The first hour training is online, Zoom ID 990 9681 5765, passcode 315648, held outside the cleanroom and the rest of time is inside the cleanroom. | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
The SPTS Rapier system is for deep silicon etch only, it is configured with dual plasma sources, dual gas inlets, electro-static clamping chuck, AMS chiller to control the chuck temperature from -15°C to + 40°C, and Claritas end-point detector.
Specifications
• Etch rate: 1.0 – 10 µm/min
• Aspect ratio: 5 – 50
• Etch depth: 5µm – several hundreds of microns
• Feature size: nm – mm scales in lateral dimension
• Sider wall roughness (scallop depth): 6nm – 700nm
• Sample size ≤ 6”
• Etch mask: only resists and SiO2 allowed
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 3:30 pm
| 4 | 3 | Register! | | |
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| Training: B15A In Person Sample Prep Training - LISE B15A - grey couches in LISE basement | | Trainer: Cathleen Hallinan | | The B15A Sample Prep lab training will cover basic safety measures within the B15A space as well as protocols, policies and relevant resources of the space. Trainings will be conducted by the lab safety officer, Cathleen Hallinan. If you have any questions or concerns please reach out to Cathleen via email at cathleen_hallinan@fas.harvard.edu | | Time | Max Attendees | Available | CNS Users ONLY |
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11:30 am - 12:30 pm
| 10 | 10 | Register! | | | | Training: CNS Cleanroom orientation - meet in front of G07 | | Trainer: John Tsakirgis | | To get familiar with CNS protocols and safety | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:00 am
please be prompt | 10 | 10 | Register! | | | | Training: DOE-1 - ULVAC Deep Oxide Etcher - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | DOE-1 - ULVAC Deep Oxide Etcher
| | Time | Max Attendees | Available | CNS Users ONLY |
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3:30 pm - 4:30 pm
617-495-1738 | 4 | 4 | Register! | | | | Training: RIE-12 - Matrix Plasma Asher - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | | RIE-12 - Matrix Plasma Asher | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 3:30 pm
617-495-1738 | 4 | 4 | Register! | | | | Training: RIE-9 - Anatech Barrel Plasma System and RIE-14 - Samco PC-300 Plasma Cleaning System - In front of the tool, inside G07 cleanroom. | | Trainer: Kenlin Huang | RIE-9 - Anatech Barrel Plasma System
RIE-14 - Samco PC-300 Plasma Cleaning System
Training section included both tools. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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4:30 pm - 5:00 pm
617-495-1738 | 5 | 5 | Register! | | |
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